Rehn L E, Birtcher R C, Donnelly S E, Baldo P M, Funk L
Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA.
Phys Rev Lett. 2001 Nov 12;87(20):207601. doi: 10.1103/PhysRevLett.87.207601. Epub 2001 Oct 24.
Previous studies have shown that the size distributions of small clusters ( n < or = 40; n = number of atoms/cluster) generated by sputtering obey an inverse power law with an exponent between -8 and -4. Here we report electron microscopy studies of the size distributions of larger clusters ( n > or = 500) sputtered by high-energy ion impacts. These new measurements also yield an inverse power law, but one with an exponent of -2 and one independent of sputtering yield, indicating that the large clusters are produced when shock waves, generated by subsurface displacement cascades, ablate the surface.
先前的研究表明,溅射产生的小团簇(n≤40;n为原子数/团簇)的尺寸分布服从指数在-8到-4之间的幂律反比关系。在此,我们报告了高能离子撞击溅射产生的较大团簇(n≥500)尺寸分布的电子显微镜研究。这些新的测量结果也得出了幂律反比关系,但指数为-2且与溅射产率无关,这表明大团簇是由表面下位移级联产生的冲击波烧蚀表面时形成的。