Zhao Bin, Haasch Richard T, MacLaren Scott
Department of Chemistry, University of Tennessee at Knoxville, Knoxville, Tennessee 37996, USA.
J Am Chem Soc. 2004 May 19;126(19):6124-34. doi: 10.1021/ja049570f.
The effect of molecular weight on the solvent-induced self-assembly of mixed poly(methyl methacrylate) (PMMA)/polystyrene (PS) brushes on silicon wafers was studied. For a series of mixed brushes with a fixed PMMA M(n) and systematically changed PS M(n), a transition in water advancing contact angle (theta(a)) from 74 degrees, the value for a flat PMMA surface, to 91 degrees, the value for a flat PS film, was observed with increasing PS M(n) after treatment with CHCl(3). Atomic force microscopy studies showed smooth surfaces for all samples. While no significant changes in surface morphologies were observed after treatment with cyclohexane, a selective solvent for PS, contact angle and XPS studies indicated that the mixed brushes with a PS M(n) slightly smaller than that of PMMA underwent self-reorganization, exhibiting a different theta(a). Intriguing surface morphologies composed of relatively ordered nanoscale domains were found from mixed brushes with PS M(n) slightly smaller than or similar to that of PMMA after treatment with acetic acid, a selective solvent for PMMA. The nanodomains are speculated to be of a micellar structure, with PS chains forming a core shielded by PMMA chains.
研究了分子量对硅片上混合聚甲基丙烯酸甲酯(PMMA)/聚苯乙烯(PS)刷溶剂诱导自组装的影响。对于一系列具有固定PMMA数均分子量(M(n))且PS M(n)系统变化的混合刷,在用CHCl(3)处理后,随着PS M(n)的增加,观察到水前进接触角(θ(a))从平坦PMMA表面的值74°转变为平坦PS膜的值91°。原子力显微镜研究表明所有样品表面均光滑。在用环己烷(PS的选择性溶剂)处理后,未观察到表面形态有明显变化,但接触角和XPS研究表明,PS M(n)略小于PMMA的混合刷发生了自重组,表现出不同的θ(a)。在用乙酸(PMMA的选择性溶剂)处理后,从PS M(n)略小于或类似于PMMA的混合刷中发现了由相对有序的纳米级域组成的有趣表面形态。推测纳米域具有胶束结构,PS链形成被PMMA链屏蔽的核心。