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N2+hν→N++N+e-过程的脉冲场电离光电子-光离子符合研究:N2和N2+的键解离能

Pulsed field-ionization photoelectron-photoion coincidence study of the process N2+hnu-->N++N+e-: bond dissociation energies of N2 and N2+.

作者信息

Tang Xiaonan, Hou Yu, Ng C Y, Ruscic Branko

机构信息

Department of Chemistry, University of California, Davis, California 95616, USA.

出版信息

J Chem Phys. 2005 Aug 15;123(7):074330. doi: 10.1063/1.1995699.

Abstract

We have examined the dissociative photoionization reaction N2+hnu-->N++N+e- near its threshold using the pulsed field-ionization photoelectron-photoion coincidence (PFI-PEPICO) time-of-flight (TOF) method. By examining the kinetic-energy release based on the simulation of the N+ PFI-PEPICO TOF peak profile as a function of vacuum ultraviolet photon energy and by analyzing the breakdown curves of N+ and N2+, we have determined the 0-K threshold or appearance energy (AE) of this reaction to be 24.2884+/-0.0010 eV. Using this 0-K AE, together with known ionization energies of N and N2, results in more precise values for the 0-K bond dissociation energies of N-N (9.7543+/-0.0010 eV) and N-N+ (8.7076+/-0.0010 eV) and the 0-K heats of formation for N (112.469+/-0.012 kcal/mol) and N+ (447.634+/-0.012 kcal/mol).

摘要

我们使用脉冲场电离光电子-光离子符合(PFI-PEPICO)飞行时间(TOF)方法,在接近阈值的情况下研究了离解光电离反应N2+hnu-->N++N+e-。通过基于N+ PFI-PEPICO TOF峰形模拟作为真空紫外光子能量的函数来检查动能释放,并通过分析N+和N2+的击穿曲线,我们确定该反应的0-K阈值或出现能量(AE)为24.2884±0.0010 eV。使用这个0-K AE,结合已知的N和N2的电离能,得到了更精确的N-N(9.7543±0.0010 eV)和N-N+(8.7076±0.0010 eV)的0-K键离解能以及N(112.469±0.012 kcal/mol)和N+(447.634±0.012 kcal/mol)的0-K生成热的值。

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