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与铁磁衬底相互作用的外延反铁磁薄膜中的界面耦合转变。

Interface coupling transition in a thin epitaxial antiferromagnetic film interacting with a ferromagnetic substrate.

作者信息

Finazzi M, Brambilla A, Biagioni P, Graf J, Gweon G-H, Scholl A, Lanzara A, Duò L

机构信息

Dipartimento di Fisica, Politecnico di Milano, Piazza Leonardo da Vinci 32, 20133 Milano, Italy.

出版信息

Phys Rev Lett. 2006 Sep 1;97(9):097202. doi: 10.1103/PhysRevLett.97.097202. Epub 2006 Aug 30.

Abstract

We report experimental evidence for a transition in the interface coupling between an antiferromagnetic film and a ferromagnetic substrate. The transition is observed in a thin epitaxial NiO film grown on top of Fe(001) as the film thickness is increased. Photoemission electron microscopy excited with linearly polarized x rays shows that the NiO film is antiferromagnetic at room temperature with in-plane uniaxial magnetic anisotropy. The anisotropy axis is perpendicular to the Fe substrate magnetization when the NiO thickness is less than about 15 A, but rapidly becomes parallel to the Fe magnetization for a NiO coverage higher than 25 A.

摘要

我们报告了关于反铁磁薄膜与铁磁衬底之间界面耦合转变的实验证据。当在Fe(001)上生长的外延NiO薄膜厚度增加时,观察到了这种转变。用线偏振X射线激发的光电子显微镜显示,NiO薄膜在室温下具有面内单轴磁各向异性的反铁磁性。当NiO厚度小于约15埃时,各向异性轴垂直于Fe衬底的磁化方向,但当NiO覆盖度高于25埃时,该轴迅速变为平行于Fe的磁化方向。

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