Mavrokefalos Anastassios, Pettes Michael T, Zhou Feng, Shi Li
Department of Mechanical Engineering, The University of Texas at Austin, Austin, TX 78712, USA.
Rev Sci Instrum. 2007 Mar;78(3):034901. doi: 10.1063/1.2712894.
Measuring in-plane thermoelectric properties of submicron thin films has remained a challenging task. Here we report a method based on a suspended microdevice for four-probe measurements of the Seebeck coefficient, thermal conductivity, electrical conductivity, and thermoelectric figure of merit of patterned indium arsenide (InAs) nanofilms assembled on the microdevice. The contact thermal resistance and intrinsic thermal resistance of the 40 nm thick InAs nanofilm sample were measured by using the nanofilm itself as a differential thermocouple to determine the temperature drops at the contacts. The microdevice was also used to measure a 190 nm thick silicon dioxide (SiO(2)) film and the results were compared with those reported in the literature. A through-substrate hole under the suspended microdevice allows for transmission electron microscopy characterization of the nanofilm sample assembled on the device. This capability enables one to correlate the measured thermoelectric properties with the crystal structures of the nanofilm.
测量亚微米薄膜的面内热电性质一直是一项具有挑战性的任务。在此,我们报告一种基于悬浮微器件的方法,用于对组装在该微器件上的图案化砷化铟(InAs)纳米薄膜的塞贝克系数、热导率、电导率和热电优值进行四探针测量。通过将40纳米厚的InAs纳米薄膜样品本身用作差分热电偶来测量接触热阻和本征热阻,以确定接触处的温度降。该微器件还用于测量190纳米厚的二氧化硅(SiO₂)薄膜,并将结果与文献报道的结果进行比较。悬浮微器件下方的贯穿衬底孔允许对组装在该器件上的纳米薄膜样品进行透射电子显微镜表征。这种能力使人们能够将测量的热电性质与纳米薄膜的晶体结构相关联。