Hayashi Kouichi, Nakajima Kazuo, Fujiwara Kozo, Nishikata Susumu
Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan.
Rev Sci Instrum. 2008 Mar;79(3):033110. doi: 10.1063/1.2898406.
Si and Ge are widely used as analyzing crystals for x-rays. Drastic and accurate shaping of Si or Ge gives significant advance in the x-ray field, although covalently bonded Si or Ge crystals have long been believed to be not deformable to various shapes. Recently, we developed a deformation technique for obtaining strongly and accurately shaped Si or Ge wafers of high crystal quality, and the use of the deformed wafer made it possible to produce fine-focused x-rays. In the present study, we prepared a cylindrical Ge wafer with a radius of curvature of 50 mm, and acquired fluorescent x-rays simultaneously from four elements by combining the cylindrical Ge wafer with a position-sensitive detector. The energy resolution of the x-ray fluorescence spectrum was as good as that obtained using a flat single crystal, and its gain was over 100. The demonstration of the simultaneous acquisition of high-resolution x-ray fluorescence spectra indicated various possibilities of x-ray spectrometry, such as one-shot x-ray spectroscopy and highly efficient wave-dispersive x-ray spectrometers.
硅和锗被广泛用作X射线分析晶体。尽管长期以来人们一直认为共价键合的硅或锗晶体无法变形为各种形状,但对硅或锗进行精确的大幅塑形在X射线领域取得了重大进展。最近,我们开发了一种变形技术,用于获得高质量的、形状精确且强烈变形的硅或锗晶片,使用这种变形晶片能够产生精细聚焦的X射线。在本研究中,我们制备了曲率半径为50毫米的圆柱形锗晶片,并通过将圆柱形锗晶片与位置敏感探测器相结合,同时从四种元素中获取荧光X射线。X射线荧光光谱的能量分辨率与使用平面单晶时获得的分辨率相当,其增益超过100。同时获取高分辨率X射线荧光光谱的演示表明了X射线光谱学的各种可能性,例如单次X射线光谱分析和高效的波色散X射线光谱仪。