Tao L, Yalin A P, Yamamoto N
Department of Mechanical Engineering, Colorado State University, Fort Collins, Colorado 80523, USA.
Rev Sci Instrum. 2008 Nov;79(11):115107. doi: 10.1063/1.2995765.
This contribution reports on the development of in situ sputter monitoring and end-point detection for ion beam etch systems using continuous-wave cavity ring-down spectroscopy (cw-CRDS). The demonstrated system is based on the detection of sputtered manganese atoms using a tunable external cavity diode laser in the vicinity of 403.07 nm. The cw-CRDS system is described and measurements from a manganese-iron target are presented. End-point detection is demonstrated by monitoring the time dependence of manganese concentration for a multilayer target comprised of alternating layers of manganese/iron and titanium. Detection limits are shown to be adequate for today's commercial ion beam sputter systems.
本论文报道了利用连续波腔衰荡光谱技术(cw-CRDS)开发用于离子束蚀刻系统的原位溅射监测和终点检测方法。所展示的系统基于使用可调谐外腔二极管激光器在403.07nm附近检测溅射的锰原子。描述了cw-CRDS系统,并给出了来自锰铁靶材的测量结果。通过监测由锰/铁和钛的交替层组成的多层靶材中锰浓度随时间的变化,展示了终点检测。结果表明,检测限对于当今的商用离子束溅射系统来说是足够的。