Xie Yongjun, Lu Zhenwu, Li Fengyou
Opt Express. 2003 May 5;11(9):992-5. doi: 10.1364/oe.11.000992.
We demonstrate experimentally the technique of fabricating large diffractive optical elements (DOEs) in thick film on a concave lens surface (mirrors) with precise alignment by using the strategy of double exposure. We adopt the method of double exposure to overcome the difficulty of processing thick photoresist on a large curved substrate. A uniform thick film with arbitrary thickness on a concave lens can be obtained with this technique. We fabricate a large concentric circular grating with a 10-ìm period on a concave lens surface in film with a thickness of 2.0 ìm after development. It is believed that this technique can also be used to fabricate larger DOEs in thicker film on the concave or convex lens surface with precise alignment. There are other potential applications of this technique, such as fabrication of micro-optoelectromechanical systems (MOEMS) or microelectromechanical systems (MEMS) and fabrication of microlens arrays on a large concave lens surface or convex lens surface with precise alignment.
我们通过实验展示了利用双曝光策略在凹透镜表面(镜面)的厚膜中制造大型衍射光学元件(DOE)并实现精确对准的技术。我们采用双曝光方法来克服在大尺寸弯曲基板上处理厚光刻胶的困难。利用该技术可在凹透镜上获得任意厚度的均匀厚膜。显影后,我们在厚度为2.0μm的凹透镜表面薄膜中制造了周期为10μm的大型同心圆形光栅。据信,该技术还可用于在凹透镜或凸透镜表面的更厚薄膜中制造更大的DOE并实现精确对准。该技术还有其他潜在应用,例如制造微光电机械系统(MOEMS)或微机电系统(MEMS),以及在大尺寸凹透镜或凸透镜表面精确对准地制造微透镜阵列。