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半价层测量:使用放射变色薄膜的简单过程方法。

Half-value layer measurement: simple process method using radiochromic film.

作者信息

Gotanda T, Katsuda T, Gotanda R, Tabuchi A, Yamamoto K, Kuwano T, Yatake H, Kashiyama K, Takeda Y

机构信息

Okayama University, Graduate School of Health Sciences, Okayama, Japan.

出版信息

Australas Phys Eng Sci Med. 2009 Sep;32(3):150-8. doi: 10.1007/BF03178642.

Abstract

Although the half-value layer (HVL) is one of the important parameters for QA and QC, constant monitoring has not been performed because the measurements using an ionization chamber (IC) are time-consuming and complicated. To solve these problems, the use of radiochromic film (GAFCHROMIC XR TYPE R: GAF-R) with step-shaped aluminum (Al) filters, referred to herein as the simple process method, has been developed. The measurement X-ray tube voltages were 120 kV, 100 kV, and 80 kV. The Al filter area, the full exposure area, and the unexposed area were set on the GAF-R so as to obtain correct data. The HVL was evaluated using the density attenuation ratio. The HVLs obtained using the GAF-R and an 1C dosimeter were compared. HVLs with X-ray tube voltages of 120 kV, 100 kV, and 80 kV using the GAF-R were 4.10 mm, 3.55 mm and 2.97 mm, respectively. The difference ratios of the HVLs using the GAF-R and the IC were 1.2%, 7.6%, and 10.0%, respectively. The HVL at 120 kV can be routinely and quickly measured using the simple process method. Therefore, an IC dosimeter is not needed for HVL measurements for QA and QC. However, the HVL measurements of low energy (100 kV and 80 kV) need attention.

摘要

尽管半值层(HVL)是质量保证(QA)和质量控制(QC)的重要参数之一,但由于使用电离室(IC)进行测量既耗时又复杂,因此尚未进行持续监测。为了解决这些问题,已开发出使用带有阶梯形铝(Al)滤光片的放射变色胶片(GAFCHROMIC XR TYPE R:GAF-R),本文将其称为简单处理方法。测量时的X射线管电压为120 kV、100 kV和80 kV。在GAF-R上设置Al滤光片区域、完全曝光区域和未曝光区域,以获取正确数据。使用密度衰减率评估HVL。比较了使用GAF-R和IC剂量计获得的HVL。使用GAF-R时,X射线管电压为120 kV、100 kV和80 kV时的HVL分别为4.10 mm、3.55 mm和2.97 mm。使用GAF-R和IC获得的HVL的差异率分别为1.2%、7.6%和10.0%。使用简单处理方法可以常规且快速地测量120 kV时的HVL。因此,QA和QC的HVL测量不需要IC剂量计。然而,低能量(100 kV和80 kV)的HVL测量需要注意。

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