Lee Hana, Kim Jeongtae
Department of Electronics Engineering, Ewha Womans University, 11-1 Daehyun-Dong, Seodaemun-Gu, Seoul, Korea.
Opt Express. 2009 Dec 21;17(26):23880-93. doi: 10.1364/OE.17.023880.
We propose a novel method for correcting the effect of nonuniform illumination on a bi-level image. The proposed method is based on a penalized nonlinear least squares objective function that measures the binariness of an image and the roughness of illumination. Compared with conventional methods, it has the advantages of 1) not suffering from a trivial minimizer, 2) not requiring tuning of design parameters, and 3) effective optimization. In addition, it yields a unique solution since the minimization of the objective function is well-posed. In simulations and experiments, the method showed better accuracy and speed than the conventional entropy-based method.
我们提出了一种校正双级图像中非均匀光照影响的新方法。所提出的方法基于一个惩罚非线性最小二乘目标函数,该函数测量图像的二值性和光照的粗糙度。与传统方法相比,它具有以下优点:1)不会受到平凡极小值的影响;2)不需要调整设计参数;3)有效优化。此外,由于目标函数的最小化是适定的,所以它产生唯一解。在模拟和实验中,该方法比传统的基于熵的方法具有更高的精度和速度。