Riedel C, Arinero R, Tordjeman Ph, Lévêque G, Schwartz G A, Alegria A, Colmenero J
Institut d'Electronique du Sud (IES), UMR CNRS 5214, Université Montpellier II, Montpellier Cedex, France.
Phys Rev E Stat Nonlin Soft Matter Phys. 2010 Jan;81(1 Pt 1):010801. doi: 10.1103/PhysRevE.81.010801. Epub 2010 Jan 8.
We present a simple method to quantitatively image the dielectric permittivity of soft materials at nanoscale using electrostatic force microscopy (EFM) by means of the double pass method. The EFM experiments are based on the measurement of the frequency shifts of the oscillating tip biased at two different voltages. A numerical treatment based on the equivalent charge method allows extracting the values of the dielectric permittivity at each image point. This method can be applied with no restrictions of film thickness and tip radius. This method has been applied to image the morphology and the nanodielectric properties of a model polymer blend of polystyrene and poly(vinyl acetate).
我们提出了一种简单的方法,通过双程法利用静电力显微镜(EFM)在纳米尺度上对软材料的介电常数进行定量成像。EFM实验基于对在两种不同电压下偏置的振荡探针频率偏移的测量。基于等效电荷法的数值处理允许提取每个图像点处的介电常数。该方法的应用不受膜厚和探针半径的限制。此方法已用于对聚苯乙烯和聚醋酸乙烯酯的模型聚合物共混物的形态和纳米介电性能进行成像。