Tanaka Yuto, Obara Go, Zenidaka Akira, Nedyalkov Nikolay N, Terakawa Mitsuhiro, Obara Minoru
School of Integrated Design Engineering, Keio University, Kohoku-ku, Yokohama-shi, Japan.
Opt Express. 2010 Dec 20;18(26):27226-37. doi: 10.1364/OE.18.027226.
We describe theoretical and experimental results on near-field interaction of two-dimensionally (2D) arrayed, high-permittivity spherical particles on a substrate in the Mie resonance scattering domain for surface nano-patterning processing. When a touching particle pair of Mie resonance particles on the substrate is considered, an electromagnetic mode different from the single particle mode is excited inside the particles, resulting in an intensity enhancement in a gap between two hotspots at particle-substrate contact points. As for 2D hexagonal close-packed particle arrays on the substrate, the refractive index of particle exhibiting a maximal enhancement factor for the 2D particle arrays is found to be shifted from the Mie resonance conditions for the single particle system.
我们描述了在米氏共振散射域中,用于表面纳米图案加工的二维(2D)排列的高介电常数球形颗粒在基底上的近场相互作用的理论和实验结果。当考虑基底上一对接触的米氏共振颗粒时,颗粒内部会激发一种不同于单颗粒模式的电磁模式,导致颗粒与基底接触点处两个热点之间的间隙处强度增强。对于基底上的二维六方密堆积颗粒阵列,发现对于二维颗粒阵列表现出最大增强因子的颗粒折射率偏离了单颗粒系统的米氏共振条件。