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低质子剂量注入InAs/GaAs自组装量子点中的非均匀展宽和合金混合

Inhomogeneous broadening and alloy intermixing in low proton dose implanted InAs/GaAs self-assembled quantum dots.

作者信息

Zaâboub Z, Ilahi B, Sfaxi L, Maaref H, Salem B, Aimez V, Morris D

机构信息

Laboratoire de Physique des Semiconducteurs et des Composants Electroniques, Faculté des Sciences, Avenue de l'environnement, 5019 Monastir, Tunisia.

出版信息

Nanotechnology. 2008 Jul 16;19(28):285715. doi: 10.1088/0957-4484/19/28/285715. Epub 2008 Jun 3.

Abstract

In this work, low-temperature photoluminescence (PL) and photoluminescence excitation (PLE) experiments have been carried out to investigate the optical and electronic properties of InAs/GaAs quantum dots (QDs) subjected to room-temperature proton implantation at various doses (5 × 10(10)-10(14) ions cm(-2)) and subsequent thermal annealing. The energy shift of the main QD emission band is found to increase with increasing implantation dose. Our measurements show clear evidence of an inhomogeneous In/Ga intermixing at low proton implantation doses (≤5 × 10(11) ions cm(-2)), giving rise to the coexistence of intermixed and non-intermixed QDs. For higher implantation doses, a decrease of both the PL linewidth and the intersublevel spacing energy have been found to occur, suggesting that the dot-size, dot-composition and dot-strain distributions evolve towards more uniform ones.

摘要

在本工作中,进行了低温光致发光(PL)和光致发光激发(PLE)实验,以研究在不同剂量(5×10¹⁰ - 10¹⁴离子/cm²)的室温质子注入及随后的热退火处理下,InAs/GaAs量子点(QD)的光学和电子性质。发现主要量子点发射带的能量位移随注入剂量的增加而增大。我们的测量结果清楚地表明,在低质子注入剂量(≤5×10¹¹离子/cm²)下存在不均匀的In/Ga混合,导致混合和未混合量子点共存。对于较高的注入剂量,发现PL线宽和子能级间距能量均减小,这表明量子点的尺寸、组成和应变分布朝着更均匀的方向发展。

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