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BiFeO3 薄膜中 71°畴壁的传导。

Conduction through 71° domain walls in BiFeO3 thin films.

机构信息

Zernike Institute for Advanced Materials, University of Groningen, 9747 AG Groningen, The Netherlands.

出版信息

Phys Rev Lett. 2011 Sep 16;107(12):127601. doi: 10.1103/PhysRevLett.107.127601. Epub 2011 Sep 14.

Abstract

Local conduction at domains and domain walls is investigated in BiFeO(3) thin films containing mostly 71° domain walls. Measurements at room temperature reveal conduction through 71° domain walls. Conduction through domains could also be observed at high enough temperatures. It is found that, despite the lower conductivity of the domains, both are governed by the same mechanisms: in the low voltage regime, electrons trapped at defect states are temperature activated but the current is limited by the ferroelectric surface charges; in the large voltage regime, Schottky emission takes place and the role of oxygen vacancies is that of selectively increasing the Fermi energy at the walls and locally reducing the Schottky barrier. This understanding provides the key to engineering conduction paths in BiFeO(3).

摘要

在含有大多数 71°畴壁的 BiFeO(3) 薄膜中研究了畴壁和畴内的局域传导。在室温下的测量表明,电流可以通过 71°畴壁传导。在足够高的温度下,也可以观察到通过畴的传导。结果发现,尽管畴的电导率较低,但它们都受相同的机制控制:在低电压区,被缺陷态俘获的电子被温度激活,但电流受到铁电表面电荷的限制;在大电压区,发生肖特基发射,氧空位的作用是选择性地增加壁处的费米能,并局部降低肖特基势垒。这种理解为在 BiFeO(3) 中设计导电路径提供了关键。

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