Liang Jian, Ren Li-Yong, Yun Mao-Jin, Wang Xing-Jun
State Key Laboratory of Transient Optics and Photonics, Xi’an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Xi’an 710119, China.
Appl Opt. 2011 Nov 1;50(31):G98-G103. doi: 10.1364/AO.50.000G98.
A dispersion tailoring scheme for obtaining slow light in a silicon-on-insulator W1-type photonic crystal waveguide, novel to our knowledge, is proposed in this paper. It is shown that, by simply shifting the first two rows of air holes adjacent to the waveguide to specific directions, slow light with large group-index, wideband, and low group-velocity dispersion can be realized. Defining a criterion of restricting the group-index variation within a ±0.8% range as a flattened region, we obtain the ultraflat slow light with bandwidths over 5.0, 4.0, 2.5, and 1.0 nm when keeping the group index at 38.0, 48.8, 65.2, and 100.4, respectively. Numerical simulations are performed utilizing the three-dimensional (3D) plane-wave expansion method and the 3D finite-difference time-domain method.
本文提出了一种据我们所知新颖的用于在绝缘体上硅W1型光子晶体波导中获得慢光的色散剪裁方案。结果表明,通过简单地将与波导相邻的前两排气孔向特定方向移动,就可以实现具有大群折射率、宽带和低群速度色散的慢光。将群折射率变化限制在±0.8%范围内的标准定义为一个平坦区域,当群折射率分别保持在38.0、48.8、65.2和100.4时,我们获得了带宽超过5.0、4.0、2.5和1.0nm的超平坦慢光。利用三维(3D)平面波展开法和3D时域有限差分法进行了数值模拟。