研究 X 射线自由电子激光辐射与光栅结构的相互作用。

Investigating the interaction of x-ray free electron laser radiation with grating structure.

机构信息

European XFEL GmbH, Hamburg, Germany.

出版信息

Opt Lett. 2012 Aug 1;37(15):3033-5. doi: 10.1364/OL.37.003033.

DOI:10.1364/OL.37.003033

Abstract

The interaction of free electron laser pulses with grating structure is investigated using 4.6±0.1 nm radiation at the FLASH facility in Hamburg. For fluences above 63.7±8.7 mJ/cm2, the interaction triggers a damage process starting at the edge of the grating structure as evidenced by optical and atomic force microscopy. Simulations based on solution of the Helmholtz equation demonstrate an enhancement of the electric field intensity distribution at the edge of the grating structure. A procedure is finally deduced to evaluate damage threshold.

摘要

利用汉堡自由电子激光设施产生的 4.6±0.1nm 辐射，研究了自由电子激光脉冲与光栅结构的相互作用。在超过 63.7±8.7mJ/cm2 的光强下，这种相互作用会触发一个损伤过程，其起始位置在光栅结构的边缘，这一点可以通过光学和原子力显微镜观察到。基于亥姆霍兹方程的模拟表明，在光栅结构的边缘处，电场强度分布得到了增强。最后，推导出了一种评估损伤阈值的方法。

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