School of Aerospace, Mechanical and Mechatronic Engineering, The University of Sydney, Sydney, New South Wales, 2006, Australia.
Nanoscale Res Lett. 2012 Aug 31;7(1):486. doi: 10.1186/1556-276X-7-486.
InAs/GaAs(001) quantum dots grown by droplet epitaxy were investigated using electron microscopy. Misfit dislocations in relaxed InAs/GaAs(001) islands were found to be located approximately 2 nm above the crystalline sample surface, which provides an impression that the misfit dislocations did not form at the island/substrate interface. However, detailed microscopy data analysis indicates that the observation is in fact an artefact caused by the surface oxidation of the material that resulted in substrate surface moving down about 2 nm. As such, caution is needed in explaining the observed interfacial structure.
采用液滴外延法生长的 InAs/GaAs(001) 量子点的电子显微镜研究。发现弛豫 InAs/GaAs(001) 岛中的失配位错大约位于晶体样品表面上方 2nm 处,这给人一种失配位错不是在岛/衬底界面形成的印象。然而,详细的显微镜数据分析表明,这种观察实际上是由于材料的表面氧化导致衬底表面向下移动约 2nm 而产生的假象。因此,在解释观察到的界面结构时需要小心。