Key Laboratory of Organosilicon Chemistry and Material Technology, Hangzhou Normal University, Hangzhou 310012, China.
J Am Soc Mass Spectrom. 2013 Jun;24(6):941-8. doi: 10.1007/s13361-013-0604-2. Epub 2013 Apr 12.
Formation of radical fragments from even-electron ions is an exception to the "even-electron rule". In this work, ferulic acid (FA) and isoferulic acid (IFA) were used as the model compounds to probe the fragmentation mechanisms and the isomeric effects on homolytic cleavage. Elimination of methyl radical and CO2 are the two competing reactions observed in the CID-MS of FA - H and IFA - H, of which losing methyl radical violates the "even-electron rule". The relative intensity of their product ions is significantly different, and thereby the two isomeric compounds can be differentiated by tandem MS. Theoretical calculations indicate that both the singlet-triplet gap and the excitation energy decrease in the transient structures, as the breaking C-O bond is lengthened. The methyl radical elimination has been rationalized as the intramolecular electronic excitation of a transient structure with an elongating C-O bond. The potential energy diagrams, completed by the addition of the energy barrier of the radical elimination, have provided a reasonable explanation of the different CID-MS behaviors of FA - H and IFA - H.
偶电子离子自由基片段的形成是“偶电子规则”的一个例外。在这项工作中,阿魏酸(FA)和异阿魏酸(IFA)被用作模型化合物,以探究它们在均裂裂解中的碎裂机制和异构效应。在FA-H和IFA-H的 CID-MS 中观察到两种竞争反应:甲基自由基消除和 CO2 消除,其中失去甲基自由基违反了“偶电子规则”。它们的产物离子的相对强度有显著差异,因此可以通过串联质谱来区分这两种异构体化合物。理论计算表明,随着 C-O 键的延长,单重态-三重态能隙和激发能都减小。甲基自由基消除可以合理地解释为具有延长 C-O 键的瞬态结构的分子内电子激发。通过加入自由基消除的能垒,完成了势能图,为FA-H和IFA-H的不同 CID-MS 行为提供了合理的解释。