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ZnSe 纳米线/硅 p-n 异质结:器件结构与光电应用。

ZnSe nanowire/Si p-n heterojunctions: device construction and optoelectronic applications.

机构信息

Institute of Functional Nano and Soft Materials (FUNSOM), Jiangsu Key Laboratory for Carbon-Based Functional Materials and Devices, Soochow University, Suzhou Jiangsu 215123, People's Republic of China.

出版信息

Nanotechnology. 2013 Oct 4;24(39):395201. doi: 10.1088/0957-4484/24/39/395201. Epub 2013 Sep 6.

Abstract

Nano-heterojunctions will play essential roles in future nano-electronic and nano-optoelectronic devices. However, their extensive applications are impeded by the complicated multi-step growth method involved and the requirements for precise nanowire (NW) positioning/alignment. Here, we develop a facile method to fabricate zinc selenide NW (ZnSeNW)/silicon p-n heterojunctions by transferring the p-type ZnSeNWs onto a SiO₂/Si substrate with pre-defined Si windows; the physical contact of the NWs with the Si substrate via van der Waals force leads to the formation of heterojunctions. Electrical measurements on the heterojunctions reveal their excellent diode characteristics with a relatively small ideality factor of ∼1.95, high rectification ratio of ∼10⁶, and low turn-on voltage of ∼0.9 V. Moreover, heterojunction field-effect transistors are constructed based on the p-ZnSeNWs and show remarkable performance enhancement compared to the device counterparts with a metal-oxide-semiconductor field-effect transistor structure. The enhanced gate coupling between the NW conduction channel and the heterojunction gate is believed to be responsible for the high device performance. Significantly, under AM 1.5G light illumination, the heterojunctions exhibit pronounced photovoltaic behavior, yielding a power conversion efficiency of ∼1.8%. Our results demonstrate the great potential of ZnSeNW/Si p-n heterojunctions in high-performance nano-device applications.

摘要

纳米异质结将在未来的纳米电子和纳米光电子设备中发挥重要作用。然而,其广泛的应用受到涉及的复杂多步生长方法和对纳米线(NW)定位/对准精度的要求的阻碍。在这里,我们开发了一种简便的方法,通过将 p 型 ZnSeNW 转移到具有预定义 Si 窗口的 SiO₂/Si 衬底上来制造硒化锌 NW(ZnSeNW)/硅 p-n 异质结;NW 通过范德华力与 Si 衬底的物理接触导致异质结的形成。对异质结的电测量显示出其出色的二极管特性,具有相对较小的理想因子约为 1.95,高整流比约为 10⁶,以及低开启电压约为 0.9 V。此外,基于 p-ZnSeNW 构建了异质结场效应晶体管,与具有金属-氧化物-半导体场效应晶体管结构的器件相比,表现出显著的性能增强。NW 导电路径与异质结栅之间的增强栅耦合被认为是器件高性能的原因。值得注意的是,在 AM 1.5G 光照射下,异质结表现出明显的光伏行为,产生约 1.8%的功率转换效率。我们的结果表明,ZnSeNW/Si p-n 异质结在高性能纳米器件应用中具有巨大的潜力。

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