Patole Shashikant P, Shin Dong Wook, Fugetsu Bunshi, Yoo Ji-Beom
SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon 440746, Republic of Korea.
J Nanosci Nanotechnol. 2013 Nov;13(11):7413-7. doi: 10.1166/jnn.2013.7875.
Transparent conducting films (TCF) made up from carbon nanotubes (CNTs) have a tremendous potential in replacing the indium tin oxide films. Compare to single wall CNTs multiwall CNTs are more metallic and are more suitable candidate for the TCF. In this letter we report the use of selectively grown mm-scale, few-wall, vertically aligned CNTs for the fabrication of TCF. Water-assisted chemical vapor deposition was used to grow the mm-scale CNTs within short growth time. A special post-growth water-vapor treatment allowed us to remove the catalyst-free CNT forest very easily from the substrate and use it for the further process. A filtration-wet transfer process was used to form the TCF. The TCF shows sheet resistance of 228 omega/sq. at 72% transparency (at 550 nm). The ratio of optical conductivity to dc conductivity was observed in between 0.21 to 0.25 for below 80% transmission.
由碳纳米管(CNT)制成的透明导电薄膜(TCF)在替代氧化铟锡薄膜方面具有巨大潜力。与单壁碳纳米管相比,多壁碳纳米管更具金属性,是更适合用于透明导电薄膜的候选材料。在本信函中,我们报道了使用选择性生长的毫米级、少壁、垂直排列的碳纳米管来制造透明导电薄膜。水辅助化学气相沉积法用于在短生长时间内生长毫米级碳纳米管。一种特殊的生长后水蒸气处理使我们能够非常轻松地从基板上去除无催化剂的碳纳米管森林,并将其用于后续工艺。采用过滤 - 湿法转移工艺来形成透明导电薄膜。该透明导电薄膜在72%透明度(550纳米处)下的方阻为228Ω/sq。对于低于80%的透射率,观察到光导率与直流电导率的比值在0.21至0.25之间。