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在 SEM 中通过 X 射线断层扫描对铜柱缺陷进行深亚微米成像。

Deep sub micrometer imaging of defects in copper pillars by X-ray tomography in a SEM.

机构信息

STMicroelectronics, 850 rue Jean Monnet, 38926 Crolles, France; CEA, LETI, MINATEC Campus, 17 rue des Martyrs, 38054 Grenoble Cedex 9, France.

STMicroelectronics, 850 rue Jean Monnet, 38926 Crolles, France.

出版信息

Micron. 2014 Mar;58:1-8. doi: 10.1016/j.micron.2013.10.014. Epub 2013 Nov 5.

Abstract

The potential of X-ray nanotomography hosted in a SEM in presented in this paper. In order to improve the detail detectability of this system, which is directly related to the X-ray source size, thin metal layers have been studied and installed in the equipment. A 3D resolution pattern has been created in order to determine the smallest detectable features by this setup. This sample is a 25 μm diameter copper pillar in which size-controlled holes have been milled using a plasma-focused ion beam. This pattern has then been scanned and the resulting 3D reconstruction demonstrates that the instrument is able to detect 500 nm diameter voids in a copper interconnection, as used in 3D integration.

摘要

本文介绍了 SEM 中 X 射线纳米断层摄影术的潜力。为了提高该系统的细节检测能力,这与 X 射线源的尺寸直接相关,因此研究并在设备中安装了薄金属层。创建了一个 3D 分辨率模式,以确定该设置可以检测到的最小特征。该样品是一个 25μm 直径的铜柱,其中使用等离子体聚焦离子束铣削出了尺寸可控的孔。然后对该图案进行扫描,得到的 3D 重建结果表明,该仪器能够检测到 3D 集成中使用的铜互连中的 500nm 直径空隙。

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