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CdSe 纳米粒子添加对溶剂蒸气暴露下 PS-b-P4VP 共聚物纳米结构形成的影响。

Effect of CdSe nanoparticle addition on nanostructuring of PS-b-P4VP copolymer via solvent vapor exposure.

机构信息

Group 'Materials + Technologies', Escuela Politécnica, Dept of Chemical & Environmental Engineering, Universidad País Vasco/Euskal Herriko Unibertsitatea, Pza. Europa 1, 20018 Donostia-San Sebastián, Spain.

Group 'Materials + Technologies', Escuela Politécnica, Dept of Chemical & Environmental Engineering, Universidad País Vasco/Euskal Herriko Unibertsitatea, Pza. Europa 1, 20018 Donostia-San Sebastián, Spain.

出版信息

J Colloid Interface Sci. 2014 Feb 15;416:25-9. doi: 10.1016/j.jcis.2013.10.029. Epub 2013 Oct 28.

Abstract

The surface morphology of poly(styrene-b-4 vinyl pyridine) (PS-b-P4VP) diblock copolymer thin films after solvent vapor annealing has been studied. Morphological features can be switched upon exposure to vapors of a solvent selective for one of the blocks. Self-assembled nanostructures such as hexagonal or striped morphologies were obtained varying vapor exposure time. In addition, the effect of the presence of CdSe nanoparticles located in the P4VP block on obtained nanostructures was analyzed. Atomic force microscopy (AFM) was used for morphological characterization of the block copolymer and the nanocomposites. AFM images showed that nanostructuring was different depending on the amount of CdSe nanoparticles, due to the decrease in P4VP chain mobility.

摘要

聚(苯乙烯-嵌-4 乙烯基吡啶)(PS-b-P4VP)两嵌段共聚物薄膜经溶剂蒸气退火后的表面形貌已被研究。通过暴露于对其中一个嵌段具有选择性的溶剂蒸气,可以改变形貌特征。通过改变蒸气暴露时间,可以得到自组装的纳米结构,如六方或条纹形貌。此外,还分析了位于 P4VP 嵌段中的 CdSe 纳米粒子的存在对得到的纳米结构的影响。原子力显微镜(AFM)用于对嵌段共聚物和纳米复合材料的形貌进行表征。AFM 图像表明,由于 P4VP 链的迁移率降低,纳米结构的形成取决于 CdSe 纳米粒子的数量,从而导致纳米结构有所不同。

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