Fourkas John T, Petersen John S
Department of Chemistry & Biochemistry, University of Maryland, College Park, MD 20742, USA.
Phys Chem Chem Phys. 2014 May 21;16(19):8731-50. doi: 10.1039/c3cp52957f.
Photolithography is a crucial technology for both research and industry. The desire to be able to create ever finer features has fuelled a push towards lithographic methods that use electromagnetic radiation or charged particles with the shortest possible wavelength. At the same time, the physics and chemistry involved in employing light or particles with short wavelengths present great challenges. A new class of approaches to photolithography on the nanoscale involves the use of photoresists that can be activated with one colour of visible or near-ultraviolet light and deactivated with a second colour. Such methods hold the promise of attaining lithographic resolution that rivals or even exceeds that currently sought by industry, while at the same time using wavelengths of light that are inexpensive to produce and can be manipulated readily. The physical chemistry of 2-colour photolithography is a rich area of science that is only now beginning to be explored.
光刻技术对于科研和工业来说都是一项关键技术。人们希望能够制造出越来越精细的特征,这推动了对光刻方法的研究,这些方法使用波长尽可能短的电磁辐射或带电粒子。与此同时,使用短波长光或粒子所涉及的物理和化学过程带来了巨大挑战。一类新的纳米级光刻方法涉及使用可被一种可见光或近紫外光激活并被另一种光灭活的光刻胶。此类方法有望实现与当前工业所追求的分辨率相媲美甚至超越它的光刻分辨率,同时使用生产成本低廉且易于操控的光波长。双色光刻的物理化学是一个丰富的科学领域,目前才刚刚开始被探索。