Harris Nicholas C, Ma Yangjin, Mower Jacob, Baehr-Jones Tom, Englund Dirk, Hochberg Michael, Galland Christophe
Opt Express. 2014 May 5;22(9):10487-93. doi: 10.1364/OE.22.010487.
We design a resistive heater optimized for efficient and low-loss optical phase modulation in a silicon-on-insulator (SOI) waveguide and characterize the fabricated devices. Modulation is achieved by flowing current perpendicular to a new ridge waveguide geometry. The resistance profile is engineered using different dopant concentrations to obtain localized heat generation and maximize the overlap between the optical mode and the high temperature regions of the structure, while simultaneously minimizing optical loss due to free-carrier absorption. A 61.6 μm long phase shifter was fabricated in a CMOS process with oxide cladding and two metal layers. The device features a phase-shifting efficiency of 24.77 ± 0.43 mW/π and a -3 dB modulation bandwidth of 130.0 ± 5.59 kHz; the insertion loss measured for 21 devices across an 8-inch wafer was only 0.23 ± 0.13 dB. Considering the prospect of densely integrated photonic circuits, we also quantify the separation necessary to isolate thermo-optic devices in the standard 220 nm SOI platform.
我们设计了一种电阻加热器,该加热器针对绝缘体上硅(SOI)波导中的高效低损耗光相位调制进行了优化,并对制造的器件进行了表征。调制是通过使电流垂直于一种新型脊形波导结构流动来实现的。利用不同的掺杂浓度设计电阻分布,以实现局部发热,并使光模式与结构的高温区域之间的重叠最大化,同时将自由载流子吸收引起的光损耗降至最低。在具有氧化物包层和两个金属层的CMOS工艺中制造了一个61.6μm长的移相器。该器件的相移效率为24.77±0.43mW/π,-3dB调制带宽为130.0±5.59kHz;在8英寸晶圆上对21个器件测量的插入损耗仅为0.23±0.13dB。考虑到密集集成光子电路的前景,我们还量化了在标准220nm SOI平台中隔离热光器件所需的间距。