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使用双金属合金的低成本合成石墨烯-氧化铝纳米片界面的自下而上方法。

Bottom-up approach for the low-cost synthesis of graphene-alumina nanosheet interfaces using bimetallic alloys.

机构信息

Department of Physics, University of Trieste, Via Valerio 2, 34127 Trieste, Italy.

Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC), Campus de Cantoblanco, 28049 Madrid, Spain.

出版信息

Nat Commun. 2014 Sep 29;5:5062. doi: 10.1038/ncomms6062.

Abstract

The production of high-quality graphene-oxide interfaces is normally achieved by graphene growth via chemical vapour deposition on a metallic surface, followed by transfer of the C layer onto the oxide, by atomic layer and physical vapour deposition of the oxide on graphene or by carbon deposition on top of oxide surfaces. These methods, however, come with a series of issues: they are complex, costly and can easily result in damage to the carbon network, with detrimental effects on the carrier mobility. Here we show that the growth of a graphene layer on a bimetallic Ni3Al alloy and its subsequent exposure to oxygen at 520 K result in the formation of a 1.5 nm thick alumina nanosheet underneath graphene. This new, simple and low-cost strategy based on the use of alloys opens a promising route to the direct synthesis of a wide range of interfaces formed by graphene and high-κ dielectrics.

摘要

高质量氧化石墨烯界面的制备通常是通过在金属表面上进行化学气相沉积来生长石墨烯,然后通过原子层和物理气相沉积将 C 层转移到氧化物上,或者通过在氧化物表面上进行碳沉积来实现。然而,这些方法存在一系列问题:它们复杂、昂贵,并且容易导致碳网络损坏,从而对载流子迁移率产生不利影响。在这里,我们表明,在双金属 Ni3Al 合金上生长石墨烯层,然后在 520K 下暴露于氧气中,会在石墨烯下方形成 1.5nm 厚的氧化铝纳米片。这种基于使用合金的新的简单且低成本策略为直接合成由石墨烯和高κ电介质形成的各种界面开辟了一条有前途的途径。

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