Institute of High Performance Computing , Singapore 138632, Singapore.
Department of Mechanical Engineering and Materials Science, Rice University , Houston, Texas 77005, United States.
Nano Lett. 2015 Oct 14;15(10):6855-61. doi: 10.1021/acs.nanolett.5b02769. Epub 2015 Oct 6.
Two-dimensional (2D) molybdenum disulfide (MoS2) has attracted significant attention recently due to its direct bandgap semiconducting characteristics. Experimental studies on monolayer MoS2 show that S vacancy concentration varies greatly; while recent theoretical studies show that the formation energy of S vacancy is high and thus its concentration should be low. We perform density functional theory calculations to study the structures and energetics of vacancy and interstitial in both grain boundary (GB) and grain interior (GI) in monolayer MoS2 and uncover an anomalous formation pathway for dislocation-double S vacancy (V2S) complexes in MoS2. In this pathway, a (5|7) defect in an S-polar GB energetically favorably converts to a (4|6) defect, which possesses a duality: dislocation and double S vacancy. Its dislocation character allows it to glide into GI through thermal activation at high temperatures, bringing the double vacancy with it. Our findings here not only explain why VS is predominant in exfoliated 2D MoS2 and V2S is predominant in chemical vapor deposition (CVD)-grown 2D MoS2 but also reproduce GB patterns in CVD-grown MoS2. The new pathway for sulfur vacancy formation revealed here provides important insights and guidelines for controlling the quality of monolayer MoS2.
二维(2D)二硫化钼(MoS2)因其直接带隙半导体特性而受到广泛关注。对单层 MoS2 的实验研究表明,S 空位浓度变化很大;而最近的理论研究表明,S 空位的形成能很高,因此其浓度应该较低。我们通过密度泛函理论计算研究了单层 MoS2 中晶界(GB)和晶内(GI)中空位和间隙的结构和能态,并揭示了 MoS2 中位错-双 S 空位(V2S)复合物的异常形成途径。在这条途径中,S 极 GB 中的(5|7)缺陷在能量上有利于转化为(4|6)缺陷,它具有双重性:位错和双 S 空位。它的位错特性使其能够在高温下通过热激活进入 GI,同时将双空位带进去。我们在这里的发现不仅解释了为什么 VS 在剥离的 2D MoS2 中占优势,而 V2S 在化学气相沉积(CVD)生长的 2D MoS2 中占优势,还再现了 CVD 生长的 MoS2 中的 GB 模式。这里揭示的 S 空位形成的新途径为控制单层 MoS2 的质量提供了重要的见解和指导。