Plugaru R, Plugaru N
National Institute for R&D in Microtechnologies, Erou Iancu Nicolae Str. 126A, Bucharest 077190, Romania.
J Phys Condens Matter. 2016 Jun 8;28(22):224008. doi: 10.1088/0953-8984/28/22/224008. Epub 2016 Mar 16.
The structural, optical and electrical conduction properties of (Li/Cu,N):ZnO codoped thin films synthesized by the sol-gel method were investigated by field emission scanning electron microscopy (FESEM), x-ray diffraction (XRD), transmission and absorption, photoluminescence (PL) and I-V measurements in order to bring evidence of the formation of acceptor centers by dual-acceptor codoping processes. The (Li 3%,N 5%):ZnO films consist of crystallites with average size of 15 nm, show 95% transmission in the visible region, and an optical band gap of 3.22 eV. The PL spectra show emission maxima at 3.21 and 2.96 eV which are related to the emission of acceptor centers and the presence of defects, respectively. Li occupies interstitial sites and may form Lii-N(O) defect complexes that act as acceptor centers. The (Cu 3%,N 5%):ZnO films consist of crystallites with average size of 12 nm, and exhibit 90% transmission in the visible region. The PL spectra reveal band edge emission at 3.23 eV and defect related emission at 2.74 eV. In the (Cu,N) codoped films, copper substitutes zinc and adopts mainly the Cu(1+) state. A possible defect complex involving Cu and N determines the transition from n- to p-type conductivity. These findings are in agreement with results of electronic structure calculations at the GGA-PBE level.
通过场发射扫描电子显微镜(FESEM)、X射线衍射(XRD)、透射与吸收、光致发光(PL)以及I-V测量,研究了采用溶胶-凝胶法合成的(Li/Cu,N):ZnO共掺杂薄膜的结构、光学和导电性能,以证明双受体共掺杂过程中受主中心的形成。(Li 3%,N 5%):ZnO薄膜由平均尺寸为15nm的微晶组成,在可见光区域的透过率为95%,光学带隙为3.22eV。PL光谱显示在3.21和2.96eV处有发射最大值,分别与受主中心的发射和缺陷的存在有关。Li占据间隙位置,可能形成Lii-N(O)缺陷复合体,其作为受主中心。(Cu 3%,N 5%):ZnO薄膜由平均尺寸为12nm的微晶组成,在可见光区域的透过率为90%。PL光谱显示在3.23eV处有带边发射,在2.74eV处有与缺陷相关的发射。在(Cu,N)共掺杂薄膜中,铜替代锌并主要采用Cu(1+)态。一种可能的涉及Cu和N的缺陷复合体决定了从n型到p型导电性的转变。这些发现与GGA-PBE水平的电子结构计算结果一致。