Kumar Neeraj, Kitoh Ai, Inoue Isao H
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Japan.
Sci Rep. 2016 May 12;6:25789. doi: 10.1038/srep25789.
Electrostatic carrier accumulation on an insulating (100) surface of SrTiO3 by fabricating a field effect transistor with Parylene-C (6 nm)/HfO2 (20 nm) bilayer gate insulator has revealed a mystifying phenomenon: sheet carrier density is about 10 times as large as ( is the sheet capacitance of the gate insulator, VG is the gate voltage, and e is the elementary charge). The channel is so clean to exhibit small subthreshod swing of 170 mV/decade and large mobility of 11 cm(2)/Vs for of 1 × 10(14) cm(-2) at room temperature. Since does not depend on either VG nor time duration, beyond is solely ascribed to negative charge compressibility of the carriers, which was in general considered as due to exchange interactions among electrons in the small limit. However, the observed is too large to be naively understood by the framework. Alternative ideas are proposed in this work.
通过制造具有聚对二甲苯-C(6纳米)/二氧化铪(20纳米)双层栅极绝缘体的场效应晶体管,在钛酸锶的绝缘(100)表面上实现了静电载流子积累,这揭示了一个神秘的现象:面载流子密度大约是(是栅极绝缘体的面电容,VG是栅极电压,e是元电荷)的10倍。该沟道非常干净,在室温下,对于1×10¹⁴厘米⁻²的情况,亚阈值摆幅小至170毫伏/十倍频程,迁移率高达11厘米²/伏秒。由于不依赖于VG或持续时间,超过的值完全归因于载流子的负电荷压缩性,在小极限情况下,这通常被认为是由于电子之间的交换相互作用。然而,观察到的值太大,无法用该框架简单地理解。这项工作提出了其他想法。