Vergentev Tikhon, Banshchikov Alexander, Filimonov Alexey, Koroleva Ekaterina, Sokolov Nikolay, Wurz Marc Christopher
Institute of Physics, Nanotechnology and Telecommunications, Peter the Great St. Petersburg Polytechnic University , Saint-Petersburg , Russia.
Divisions of Solid State Physics and Physics of Dielectric and Semiconductors, Ioffe Institute , Saint-Petersburg , Russia.
Sci Technol Adv Mater. 2016 Nov 25;17(1):799-806. doi: 10.1080/14686996.2016.1246940. eCollection 2016.
LaF/SrF multilayer heterostructures with thicknesses of individual layers in the range 5-100 nm have been grown on MgO(100) substrates using molecular beam epitaxy. The longitudinal conductivity of the films has been measured using impedance spectroscopy in the frequency range 10-10 Hz and a temperature range 300-570 K. The ionic DC conductivities have been determined from Nyquist impedance diagrams and activation energies from the Arrhenius-Frenkel equation. An increase of the DC conductivity has been observed to accompany decreased layer thickness for various thicknesses as small as 25 nm. The greatest conductivity has been shown for a multilayer heterostructure having thicknesses of 25 nm per layer. The structure has a conductivity two orders of magnitude greater than pure LaF bulk material. The increasing conductivity can be understood as a redistribution of charge carriers through the interface due to differing chemical potentials of the materials, by strong lattice-constant mismatch, and/or by formation of a solid LaSrF solution at the interface during the growth process.
利用分子束外延技术在MgO(100)衬底上生长了各层厚度在5 - 100 nm范围内的LaF/SrF多层异质结构。使用阻抗谱在10⁻¹⁰ Hz的频率范围和300 - 570 K的温度范围内测量了薄膜的纵向电导率。通过奈奎斯特阻抗图确定了离子直流电导率,并根据阿仑尼乌斯 - 弗伦克尔方程确定了活化能。对于低至25 nm的各种厚度,观察到直流电导率的增加伴随着层厚度的减小。对于每层厚度为25 nm的多层异质结构,显示出最大的电导率。该结构的电导率比纯LaF块状材料大两个数量级。电导率的增加可以理解为由于材料的化学势不同、强烈晶格常数失配和/或在生长过程中在界面处形成固体LaSrF固溶体,电荷载流子通过界面重新分布所致。