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制造问题竞赛[受邀]

Manufacturing problem contest [invited].

作者信息

Poitras Daniel, Li Li, Jacobson Michael, Cooksey Catherine

出版信息

Appl Opt. 2017 Feb 1;56(4):C1-C10. doi: 10.1364/AO.56.0000C1.

Abstract

For the Manufacturing Problem contest, participants were asked to fabricate on provided blank substrates a challenging filter with specific reflectance and transmittance targets covering a wavelength range from 400 nm to 1100 nm. The problem was selected such that to achieve a performance close to the targets, a submitted filter had to include at least one thin absorbing layer. Nine teams from six countries participated in the contest using different deposition techniques. The teams' designs had a number of layers varying from 36 to 235, and a total thickness from 2.0 μm to 14.6 μm. The performances of all submitted filters were measured by two independent laboratories, and the results were presented at the Optical Interference Coating meeting in June 2016.

摘要

在制造问题竞赛中,要求参与者在提供的空白基板上制造一个具有挑战性的滤波器,该滤波器在400纳米至1100纳米波长范围内具有特定的反射率和透射率目标。选择该问题是为了使提交的滤波器要达到接近目标的性能,就必须至少包含一层薄吸收层。来自六个国家的九支队伍使用不同的沉积技术参加了竞赛。各团队的设计层数从36层到235层不等,总厚度从2.0微米到14.6微米。所有提交滤波器的性能均由两个独立实验室进行测量,结果在2016年6月的光学干涉涂层会议上公布。

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