Suppr超能文献

在存在脊柱植入物的情况下对经皮脊柱直流电刺激进行建模。

Modeling Trans-Spinal Direct Current Stimulation in the Presence of Spinal Implants.

出版信息

IEEE Trans Neural Syst Rehabil Eng. 2019 May;27(5):790-797. doi: 10.1109/TNSRE.2019.2900377. Epub 2019 Feb 22.

Abstract

Trans-spinal direct current stimulation (tsDCS) is a technique considered for the treatment of corticospinal damage or dysfunction. TsDCS aims to induce functional modulation in the corticospinal circuitry via a direct current (DC) generated an electric field (EF). To ensure subject safety, subjects with metallic implants are generally excluded from receiving neural dc stimulation. However, spinal injuries often require spinal implants for stabilization. Our goal was to investigate implant imposed changes to EF and current density (CD) magnitude during tsDCS. We simulated the EF and CD, generated by tsDCS in the presence of spinal rods for two electrode configurations and four implant locations along the spinal cord. For each scenario, a no-implant condition was computed for comparison. We assessed changes in EF and CD at the implant location and the EF inside the spinal cord. Our results show that implant presence was able to influence peak CD, compared to the no-implant condition. Nonetheless, the highest calculated CD levels were a factor six lower than those thought to lead to hazardous tissue-damaging effects. Additionally, implant presence did not considerably affect the average EF inside the spinal cord. Our findings do therefore not indicate potentially unsafe CD levels, or significant alterations to stimulation intensity inside the spinal cord, caused by a spinal implant during tsDCS. Our results are relevant to the safety of transcutaneous spinal stimulation applied in the presence of metallic spinal implants.

摘要

经颅直流电刺激(trans-spinal direct current stimulation, tsDCS)被认为可用于治疗皮质脊髓损伤或功能障碍。tsDCS 通过生成电场(electric field, EF)的直流电(direct current, DC)来诱导皮质脊髓回路的功能调节。为了确保受试者的安全,通常会将有金属植入物的受试者排除在接受神经直流刺激之外。然而,脊髓损伤通常需要脊柱植入物来稳定脊柱。我们的目标是研究在 tsDCS 期间植入物对 EF 和电流密度(current density, CD)大小的影响。我们模拟了两种电极配置和脊髓上四个植入位置在存在脊柱杆的情况下 tsDCS 产生的 EF 和 CD。对于每种情况,我们都计算了没有植入物的情况进行比较。我们评估了植入物位置和脊髓内 EF 处的 EF 和 CD 的变化。研究结果表明,与无植入物情况相比,植入物的存在能够影响峰值 CD。然而,计算出的最高 CD 水平比被认为会导致有害组织损伤效应的水平低 6 倍。此外,植入物的存在并没有显著影响脊髓内的平均 EF。因此,我们的研究结果并没有表明在 tsDCS 期间由于脊柱植入物存在而导致潜在的不安全 CD 水平或对脊髓内刺激强度的显著改变。我们的研究结果与在存在金属脊柱植入物的情况下应用经皮脊柱刺激的安全性有关。

文献AI研究员

20分钟写一篇综述,助力文献阅读效率提升50倍。

立即体验

用中文搜PubMed

大模型驱动的PubMed中文搜索引擎

马上搜索

文档翻译

学术文献翻译模型,支持多种主流文档格式。

立即体验