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具有高栅极和多凹槽缓冲层的新型高能效氮化铝镓/氮化镓高电子迁移率晶体管

Novel High-Energy-Efficiency AlGaN/GaN HEMT with High Gate and Multi-Recessed Buffer.

作者信息

Zhu Shunwei, Jia Hujun, Li Tao, Tong Yibo, Liang Yuan, Wang Xingyu, Zeng Tonghui, Yang Yintang

机构信息

School of Microelectronics, Xidian University, Xi'an 710071, China.

出版信息

Micromachines (Basel). 2019 Jul 2;10(7):444. doi: 10.3390/mi10070444.

Abstract

A novel AlGaN/GaN high-electron-mobility transistor (HEMT) with a high gate and a multi-recessed buffer (HGMRB) for high-energy-efficiency applications is proposed, and the mechanism of the device is investigated using technology computer aided design (TCAD) Sentaurus and advanced design system (ADS) simulations. The gate of the new structure is 5 nm higher than the barrier layer, and the buffer layer has two recessed regions in the buffer layer. The TCAD simulation results show that the maximum drain saturation current and transconductance of the HGMRB HEMT decreases slightly, but the breakdown voltage increases by 16.7%, while the gate-to-source capacitance decreases by 17%. The new structure has a better gain than the conventional HEMT. In radio frequency (RF) simulation, the results show that the HGMRB HEMT has 90.8%, 89.3%, and 84.4% power-added efficiency (PAE) at 600 MHz, 1.2 GHz, and 2.4 GHz, respectively, which ensures a large output power density. Overall, the results show that the HGMRB HEMT is a better prospect for high energy efficiency than the conventional HEMT.

摘要

提出了一种用于高能效应用的具有高栅极和多凹槽缓冲层(HGMRB)的新型氮化铝镓/氮化镓高电子迁移率晶体管(HEMT),并使用技术计算机辅助设计(TCAD)Sentaurus和高级设计系统(ADS)模拟研究了该器件的机理。新结构的栅极比势垒层高5nm,缓冲层在缓冲层中有两个凹槽区域。TCAD模拟结果表明,HGMRB HEMT的最大漏极饱和电流和跨导略有下降,但击穿电压提高了16.7%,而栅源电容下降了17%。新结构比传统HEMT具有更好的增益。在射频(RF)模拟中,结果表明,HGMRB HEMT在600MHz、1.2GHz和2.4GHz时的功率附加效率(PAE)分别为90.8%、89.3%和8'4.4%,这确保了较大的输出功率密度。总体而言,结果表明,HGMRB HEMT在高能效方面比传统HEMT具有更好的前景。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/d040/6680630/1ac5d4272d77/micromachines-10-00444-g001.jpg

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