用于酸性溶液分离的二氧化硅基反渗透膜

Silica-Based RO Membranes for Separation of Acidic Solution.

作者信息

Ishii Katsunori, Ikeda Ayumi, Takeuchi Toshichika, Yoshiura Junko, Nomura Mikihiro

机构信息

Department of Applied Chemistry, Shibaura Institute of Technology, 3-7-5 Toyosu, Koto-ku, Tokyo 135-8548, Japan.

National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan.

出版信息

Membranes (Basel). 2019 Aug 1;9(8):94. doi: 10.3390/membranes9080094.

DOI:10.3390/membranes9080094

PMID:31374961

原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC6723749/

Abstract

The development of acid separation membranes is important. Silica-based reverse osmosis (RO) membranes for sulfuric acid (HSO) solution separation were developed by using a counter diffusion chemical vapor deposition (CVD) method. Diphenyldimethoxysilane (DPhDMOS) was used as a silica precursor. The deposited membrane showed the HSO rejection of 81% with a total flux of 5.8 kg m h from the 10 mol L of HSO. The γ-alumina substrate was damaged by the permeation of the HSO solution. In order to improve acid stability, the silica substrates were developed. The acid stability was checked by the gas permeation tests after immersing in 1 mol L of the HSO solution for 24 h. The N permeance decreased by 11% with the acid treatment through the silica substrate, while the permeance decreased to 94% through the γ-alumina substrate. The flux and the rejection through the DPhDMOS-derived membrane on the silica substrate were stable in the 70 wt % HSO solution.

摘要

酸分离膜的开发很重要。通过反扩散化学气相沉积（CVD）法制备了用于硫酸（H₂SO₄）溶液分离的二氧化硅基反渗透（RO）膜。使用二苯基二甲氧基硅烷（DPhDMOS）作为二氧化硅前驱体。沉积的膜对10 mol/L的H₂SO₄溶液的截留率为81%，总通量为5.8 kg m⁻² h⁻¹。γ-氧化铝基材因H₂SO₄溶液的渗透而受损。为了提高酸稳定性，开发了二氧化硅基材。通过在1 mol/L的H₂SO₄溶液中浸泡24 h后的气体渗透测试来检查酸稳定性。通过二氧化硅基材进行酸处理后，N₂渗透率下降了11%，而通过γ-氧化铝基材时渗透率下降到94%。在70 wt%的H₂SO₄溶液中，二氧化硅基材上由DPhDMOS衍生的膜的通量和截留率是稳定的。