ACS Appl Mater Interfaces. 2019 Dec 18;11(50):47197-47206. doi: 10.1021/acsami.9b14663. Epub 2019 Dec 9.
Two-dimensional germanium sulfide (GeS), an analogue of phosphorene, has attracted broad attention owing to its excellent environmental stabilities, fascinating electronic and optical properties, and applications in various nanodevices. In spite of the current achievements on 2D GeS, the report of ultrathin few-layer GeS nanosheets within 5 nm is still lacking. Here in this contribution, we have achieved preparation of ultrathin few-layer GeS nanosheets with thicknesses of 1.3 ± 0.1 nm [approximately three layers (∼3L)], 3.2 ± 0.2 nm (∼6L), and 4.2 ± 0.3 nm (∼8L) via a typical liquid-phase exfoliation (LPE) method. Based on various experimental characterizations and first-principles calculations, the layer-dependent electronic, transport, and optical properties are investigated. For the few-layer GeS nanosheets, enhanced light absorption in the UV-vis region and superior photoresponse behavior with increasing layer number is observed, while for the thin films above 10 nm, the properties degenerate to the bulk feature. In addition, the as-prepared ultrathin nanosheets manifest great potential in the applications of photoelectrochemical (PEC)-type photodetectors, exhibiting excellent and stable periodic photoresponse behavior under the radiation of white light. The ∼8L GeS-based photodetector exhibits superior performance than the thinner GeS nanosheets (<4 nm), even better as compared to the bulk or film (above 10 nm) counterparts in terms of higher photoresponsivity along with remarkable photodetection performance in the UV-vis region. This work not only provides direct and solid evidence of the layer-number evolutionary band structure, mobility, and optical properties of ultrathin 2D GeS nanosheets but also promotes the foreseeable applications of 2D GeS as energy-related photoelectric devices.
二维锗化硫(GeS)是黑磷的类似物,由于其出色的环境稳定性、迷人的电子和光学特性以及在各种纳米器件中的应用,引起了广泛关注。尽管目前已经在 2D GeS 方面取得了一些成果,但仍缺乏关于厚度在 5nm 以内的超薄少层 GeS 纳米片的报道。在本研究中,我们通过典型的液相剥离(LPE)方法成功制备了厚度分别为 1.3±0.1nm[约三层(∼3L)]、3.2±0.2nm(∼6L)和 4.2±0.3nm(∼8L)的超薄少层 GeS 纳米片。通过各种实验表征和第一性原理计算,研究了其依赖于层数的电子、输运和光学性质。对于少层 GeS 纳米片,观察到在 UV-vis 区域增强的光吸收以及随着层数增加的优越光响应行为,而对于厚度大于 10nm 的薄膜,其性质退化到体相特征。此外,所制备的超薄纳米片在光电化学(PEC)型光电探测器的应用中表现出巨大的潜力,在白光辐射下表现出优异且稳定的周期性光响应行为。与更薄的 GeS 纳米片(<4nm)相比,所制备的∼8L GeS 基光电探测器具有更好的性能,甚至优于体相或薄膜(厚度大于 10nm)对应物,表现出更高的光响应率以及在 UV-vis 区域内的显著光电检测性能。这项工作不仅为超薄二维 GeS 纳米片的层数演化能带结构、迁移率和光学性质提供了直接而可靠的证据,而且还推动了二维 GeS 在能源相关光电器件中的可预见应用。