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碳硼烷中硼中心自由基的氧化生成

Oxidative Generation of Boron-Centered Radicals in Carboranes.

作者信息

Mills Harrison A, Martin Joshua L, Rheingold Arnold L, Spokoyny Alexander M

机构信息

Department of Chemistry and Biochemistry, University of California, Los Angeles, 607 Charles E. Young Drive East, Los Angeles, California 90095, United States.

Department of Chemistry and Biochemistry, University of California, San Diego, 9500 Gilman Drive, La Jolla, California 92093, United States.

出版信息

J Am Chem Soc. 2020 Mar 11;142(10):4586-4591. doi: 10.1021/jacs.0c00300. Epub 2020 Mar 3.

Abstract

We report the first indirect observation and use of boron vertex-centered carboranyl radicals generated by the oxidation of modified carboranyl precursors. These radical intermediates are formed by the direct oxidation of a B-B bond between a boron cluster cage and an exopolyhedral boron-based substituent (, -BFK, -B(OH)). The generated radical species are shown to be competent substrates in reactions with oxygen-based radicals, dichalcogenides, and N-heterocycles, yielding the corresponding substituted carboranes containing B-O, B-S, B-Se, B-Te, and B-C bonds. Remarkably, this chemistry tolerates various electronic environments, providing access to facile substitution chemistry at both electron-rich and electron-poor B-H vertices in carboranes.

摘要

我们报道了对由改性碳硼烷前体氧化产生的硼顶点中心碳硼烷基自由基的首次间接观察和应用。这些自由基中间体是由硼簇笼与多面体外部硼基取代基(-BFK、-B(OH))之间的B-B键直接氧化形成的。所产生的自由基物种在与氧自由基、二硫属化物和N-杂环的反应中表现为活性底物,生成含有B-O、B-S、B-Se、B-Te和B-C键的相应取代碳硼烷。值得注意的是,这种化学反应能够耐受各种电子环境,为在富电子和贫电子的碳硼烷B-H顶点进行简便的取代化学提供了途径。

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