Wilhelm Thomas S, Kolberg Alex P, Baboli Mohadeseh A, Abrand Alireza, Bertness Kris A, Mohseni Parsian K
Microsystem Engineering, Rochester Institute of Technology, Rochester, NY 14623, United States.
NanoPower Research Laboratories, Rochester Institute of Technology, Rochester, NY 14623, United States.
ECS J Solid State Sci Technol. 2019;8(6). doi: 10.1149/2.0311906jss.
A practical nanofabrication process is detailed here for the generation of black GaAs. Discontinuous thin films of Au nanoparticles are electrodeposited onto GaAs substrates to catalyze site-specific etching in a solution of KMnO and HF according to the metal-assisted chemical etching mechanism. This provides a solution-based and lithography-free method for fabricating sub-wavelength nanostructure arrays that exhibit solar-weighted reflectance approaching 4 %. This two-step benchtop process can be entirely performed at room-temperature without lithographic patterning or vacuum instrumentation, providing an alternative high-throughput nanotexturing approach for thin-film photovoltaics applications.
本文详细介绍了一种用于制备黑色砷化镓的实用纳米制造工艺。根据金属辅助化学蚀刻机制,将金纳米颗粒的不连续薄膜电沉积到砷化镓衬底上,以催化在高锰酸钾和氢氟酸溶液中的特定位置蚀刻。这提供了一种基于溶液且无需光刻的方法来制造亚波长纳米结构阵列,该阵列的太阳加权反射率接近4%。这种两步台式工艺可以在室温下完全进行,无需光刻图案化或真空仪器,为薄膜光伏应用提供了一种替代的高通量纳米纹理化方法。