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垂直 pn 异质结肖特基势垒晶体管中的渗流限制双电荷传输

Percolation-Limited Dual Charge Transport in Vertical pn Heterojunction Schottky Barrier Transistors.

作者信息

Lim Dong Un, Kim Seongchan, Choi Young Jin, Jo Sae Byeok, Cho Jeong Ho

机构信息

Department of Chemical and Biomolecular Engineering, Yonsei University, Seoul 03722, Korea.

SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon 440-746, Korea.

出版信息

Nano Lett. 2020 May 13;20(5):3585-3592. doi: 10.1021/acs.nanolett.0c00523. Epub 2020 May 4.

Abstract

Solution-processed, high-speed, and polarity-selective organic vertical Schottky barrier (SB) transistors and logic gates are presented. The organic layer, which is a bulk heterojunction (BHJ) composed of PBDB-T and PCBM, is employed to simultaneously realize vertical electron and hole transports through the separate p-channel and n-channel. The gate-modulated graphene work functions enable broad modulation of SB heights at both the graphene-PBDB-T and graphene-PCBM heterointerfaces. Interestingly, the fine-tuned energy-level alignment enables an exclusive injection of holes or electrons unlike conventional BHJ-based ambipolar transistors, leading to a clear transition between p-channel and n-channel single-carrier-like transistor characteristics. Furthermore, the improved percolation-limited dual charge transport in vertical architecture results in high charge carrier density and high-speed on-off switching characteristics, providing a high on-off current ratio exceeding 10 and an operation speed of 100 kHz. Solution-based on-substrate fabrications of low-power complementary logic gates such as NOT, NOR, and NAND are also successfully performed.

摘要

本文展示了溶液法制备的、高速且具有极性选择性的有机垂直肖特基势垒(SB)晶体管及逻辑门。有机层采用由PBDB-T和PCBM组成的体异质结(BHJ),通过独立的p沟道和n沟道同时实现垂直电子和空穴传输。栅极调制的石墨烯功函数能够在石墨烯-PBDB-T和石墨烯-PCBM异质界面处对SB高度进行广泛调制。有趣的是,与传统基于BHJ的双极性晶体管不同,经过微调的能级对准能够实现空穴或电子的排他性注入,从而在p沟道和n沟道单载流子型晶体管特性之间实现清晰的转变。此外,垂直结构中改进的逾渗限制双电荷传输导致高电荷载流子密度和高速开关特性,提供超过10的高开/关电流比和100 kHz的工作速度。基于溶液的低功耗互补逻辑门(如非门、或非门和与非门)的衬底上制造也成功完成。

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