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通过金属硫化合成的可扩展单层MoS中的超快激子动力学

Ultrafast Exciton Dynamics in Scalable Monolayer MoS Synthesized by Metal Sulfurization.

作者信息

Tsai Hsu-Sheng, Huang Yung-Hung, Tsai Po-Cheng, Chen Yi-Jia, Ahn Hyeyoung, Lin Shih-Yen, Lu Yu-Jung

机构信息

Research Center for Applied Sciences, Academia Sinica, Taipei 11529, Taiwan.

Space Environment Simulation Research Infrastructure, Harbin Institute of Technology, 150001, Harbin, China.

出版信息

ACS Omega. 2020 May 4;5(19):10725-10730. doi: 10.1021/acsomega.0c00187. eCollection 2020 May 19.

Abstract

Excitons in monolayer transition metal dichalcogenides (TMDs) have exceptionally large binding energies and dominate the optical properties of materials. Exploring the relaxation behavior of excitons is crucial for understanding the fundamental physics as well as the performance of TMD-based optoelectronic devices. However, ultrafast carrier dynamics is sensitive to the structural defects and surface conditions of TMDs, depending on the growth or transfer process. Here, we utilized pump-probe transient absorption (TA) spectroscopy with a white-light probe to investigate the dynamics of excitons in monolayer MoS synthesized by the metal sulfurization method. The sulfurization method was used for the fabrication of large-scale, continuous, and uniform thin films with a controllable number of layers. The excitation dynamics of the wafer-size monolayer MoS is found to be comparable to that of monolayer MoS flakes grown by chemical vapor deposition (CVD). The dominant processes of carrier relaxation in the monolayer MoS are exciton-exciton annihilation (hundreds of femtoseconds), the trapping of the excitons by surface states (a few picoseconds), and interband carrier-phonon scattering (tens of picoseconds). Moreover, the induced absorption due to mid-gap defects, which is often observed for samples fabricated by growth methods, such as CVD, is not observed for our continuous and uniform monolayer films. Understanding the charge carrier dynamics of the exciton in the scalable and uniform monolayer MoS can provide physical insights that are valuable in the design and development of complex 2D devices.

摘要

单层过渡金属二硫属化物(TMDs)中的激子具有异常大的结合能,并主导着材料的光学性质。探索激子的弛豫行为对于理解基本物理原理以及基于TMD的光电器件的性能至关重要。然而,超快载流子动力学对TMDs的结构缺陷和表面条件敏感,这取决于生长或转移过程。在此,我们利用白光探测的泵浦-探测瞬态吸收(TA)光谱来研究通过金属硫化法合成的单层MoS中激子的动力学。硫化法用于制备具有可控层数的大规模、连续且均匀的薄膜。发现晶圆尺寸的单层MoS的激发动力学与通过化学气相沉积(CVD)生长的单层MoS薄片的激发动力学相当。单层MoS中载流子弛豫的主要过程是激子-激子湮灭(数百飞秒)、激子被表面态俘获(几皮秒)以及带间载流子-声子散射(几十皮秒)。此外,对于通过诸如CVD等生长方法制备的样品经常观察到的由于带隙中间缺陷引起的诱导吸收,在我们连续且均匀的单层薄膜中未观察到。理解可扩展且均匀的单层MoS中激子的电荷载流子动力学可以提供在复杂二维器件的设计和开发中具有重要价值的物理见解。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fa4f/7240830/35e74d228ca7/ao0c00187_0001.jpg

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