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单太赫兹脉冲在InSb和InAs中引起的碰撞电离和谷间电子散射。

Impact ionization and intervalley electron scattering in InSb and InAs induced by a single terahertz pulse.

作者信息

Ašmontas Steponas, Bumelienė Skaidra, Gradauskas Jonas, Raguotis Romas, Sužiedėlis Algirdas

机构信息

Center for Physical Sciences and Technology, 3 Saulėtekio Av., 10257, Vilnius, Lithuania.

Center for Physical Sciences and Technology, Saulėtekio av. 3, 10257, Vilnius, Lithuania.

出版信息

Sci Rep. 2020 Jun 29;10(1):10580. doi: 10.1038/s41598-020-67541-1.

Abstract

Electronic properties of InSb and InAs are sensitive to electric field due to their narrow forbidden energy gaps and big difference in effective masses of electrons in different conduction band valleys. Here we report impact ionization processes and redistribution of electrons between the Γ, L and X valleys induced by a single ultrashort terahertz (THz) pulse at 80 K temperature. Monte Carlo simulation revealed that electron motion in this case has near ballistic character. The threshold electric field of impact ionization increases as the THz pulse gets shorter, and the process of impact ionization essentially raises cooling rate of hot electrons. The L valley gets mainly occupied by electrons in InSb while the X valley holds the majority of electrons in InAs at strong electric fields, respectively above 20 kV/cm and 90 kV/cm. The calculated results are in good agreement with the available experimental data.

摘要

由于InSb和InAs的禁带宽度窄且不同导带谷中电子的有效质量差异大,它们的电学性质对电场敏感。在此,我们报告了在80K温度下由单个超短太赫兹(THz)脉冲诱导的碰撞电离过程以及电子在Γ、L和X谷之间的重新分布。蒙特卡罗模拟表明,在这种情况下电子运动具有近弹道特性。碰撞电离的阈值电场随着太赫兹脉冲变短而增加,并且碰撞电离过程实质上提高了热电子的冷却速率。在强电场下,分别高于20kV/cm和90kV/cm时,InSb中的电子主要占据L谷,而InAs中的电子大部分占据X谷。计算结果与现有实验数据吻合良好。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7688/7324565/08eb97222bc0/41598_2020_67541_Fig1_HTML.jpg

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