不同沉积条件下TiNi形状记忆合金薄膜的晶粒尺寸及相变行为

Grain Size and Phase Transformation Behavior of TiNi Shape-Memory-Alloy Thin Film under Different Deposition Conditions.

作者信息

Bae Joohyeon, Lee Hyunsuk, Seo Duckhyeon, Yun Sangdu, Yang Jeonghyeon, Huh Sunchul, Jeong Hyomin, Noh Jungpil

机构信息

Department of Energy and Mechanical Engineering and Institute of Marine Industry, Gyeongsang National University, 2 Tongyeonghaean-ro, Tongyeong 53064, Korea.

Department of Mechanical System Engineering, Gyeongsang National University, 2 Tongyeonghaean-ro, Tongyeong 53064, Korea.

出版信息

Materials (Basel). 2020 Jul 20;13(14):3229. doi: 10.3390/ma13143229.

DOI:10.3390/ma13143229

PMID:32698445

原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC7412040/

Abstract

TiNi shape-memory-alloy thin films can be used as small high-speed actuators or sensors because they exhibit a rapid response rate. In recent years, the transformation temperature of these films, manufactured via a magnetron sputtering method, was found to be lower than that of the bulk alloys owing to the small size of the grain. In this study, deposition conditions (growth rate, film thickness, and substrate temperature) affecting the grain size of thin films were investigated. The grain size of the thin film alloys was found to be most responsive to the substrate temperature.

摘要

钛镍形状记忆合金薄膜可作为小型高速致动器或传感器使用，因为它们具有快速的响应速度。近年来，通过磁控溅射法制造的这些薄膜的转变温度，由于晶粒尺寸小，被发现低于块状合金的转变温度。在本研究中，研究了影响薄膜晶粒尺寸的沉积条件（生长速率、薄膜厚度和基板温度）。发现薄膜合金的晶粒尺寸对基板温度最为敏感。