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揭示多晶Mo-BiVO薄膜中的纳米级化学不均匀性

Revealing Nanoscale Chemical Heterogeneities in Polycrystalline Mo-BiVO Thin Films.

作者信息

Eichhorn Johanna, Reyes-Lillo Sebastian E, Roychoudhury Subhayan, Sallis Shawn, Weis Johannes, Larson David M, Cooper Jason K, Sharp Ian D, Prendergast David, Toma Francesca M

机构信息

Chemical Sciences Division and Joint Center for Artificial Photosynthesis, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA, 94720, USA.

Walter Schottky Institut and Physik Department, Technische Universität München, Am Coulombwall 4, Garching, 85748, Germany.

出版信息

Small. 2020 Sep;16(35):e2001600. doi: 10.1002/smll.202001600. Epub 2020 Aug 5.

Abstract

The activity of polycrystalline thin film photoelectrodes is impacted by local variations of the material properties due to the exposure of different crystal facets and the presence of grain/domain boundaries. Here a multi-modal approach is applied to correlate nanoscale heterogeneities in chemical composition and electronic structure with nanoscale morphology in polycrystalline Mo-BiVO . By using scanning transmission X-ray microscopy, the characteristic structure of polycrystalline film is used to disentangle the different X-ray absorption spectra corresponding to grain centers and grain boundaries. Comparing both spectra reveals phase segregation of V O at grain boundaries of Mo-BiVO thin films, which is further supported by X-ray photoelectron spectroscopy and many-body density functional theory calculations. Theoretical calculations also enable to predict the X-ray absorption spectral fingerprint of polarons in Mo-BiVO . After photo-electrochemical operation, the degraded Mo-BiVO films show similar grain center and grain boundary spectra indicating V O dissolution in the course of the reaction. Overall, these findings provide valuable insights into the degradation mechanism and the impact of material heterogeneities on the material performance and stability of polycrystalline photoelectrodes.

摘要

由于不同晶面的暴露以及晶粒/畴界的存在,多晶薄膜光电极的活性会受到材料特性局部变化的影响。在此,采用了一种多模态方法,将多晶Mo-BiVO₄中化学成分和电子结构的纳米级不均匀性与纳米级形态联系起来。通过使用扫描透射X射线显微镜,利用多晶薄膜的特征结构来解析对应于晶粒中心和晶界的不同X射线吸收光谱。比较这两种光谱揭示了在Mo-BiVO₄薄膜晶界处V₂O₅的相分离,这进一步得到了X射线光电子能谱和多体密度泛函理论计算的支持。理论计算还能够预测Mo-BiVO₄中极化子的X射线吸收光谱指纹。经过光电化学操作后,降解的Mo-BiVO₄薄膜显示出相似的晶粒中心和晶界光谱,表明在反应过程中V₂O₅发生了溶解。总体而言,这些发现为多晶光电极的降解机制以及材料不均匀性对材料性能和稳定性的影响提供了有价值的见解。

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