Shin Hee Jun, Bae Seongkwang, Sim Sangwan
Pohang Accelerator Laboratory, POSTECH, Pohang 37673, Korea.
Nanoscale. 2020 Nov 12;12(43):22185-22191. doi: 10.1039/d0nr05897a.
Enhanced many-body interactions due to strong Coulomb interactions and quantum confinement are one of the most prominent features of two-dimensional systems. The Auger process is a representative many-body interaction typically observed in two-dimensional semiconductors, determining important physical properties of materials, such as carrier lifetime, photoconductivity, and emission quantum yield. Recently, platinum dichalcogenides, represented by PtSe2 and PtS2, have attracted great attention due to their superior air stability, thickness-dependent semimetal-to-semiconductor transition, and exotic magnetic characteristics. However, the Auger process in platinum dichalcogenides has not been investigated to date. Here, we utilized ultrafast optical-pump terahertz-probe spectroscopy to explore carrier dynamics in few-layer semiconducting PtSe2. Most of the excited carriers are trapped by defects within ∼10 ps after excitation due to high defect density. We overcome this challenge by raising the excitation intensity to saturate trap sites with carriers, and observed a many-body process involving the carriers that survived the rapid trapping. This process is not band-to-band Auger recombination, but rather defect-assisted Auger recombination in which free carriers interact with trapped carriers at defects. Theoretical simulations show that this three-body Auger process can be approximated as bimolecular recombination at the rate of ∼3.3 × 10-3 cm2 s-1. This work provides insights into the interplay between ultrafast many-body processes and defects in two-dimensional semiconductors.
由于强库仑相互作用和量子限制导致的增强多体相互作用是二维系统最显著的特征之一。俄歇过程是一种典型的在二维半导体中观察到的多体相互作用,它决定了材料的重要物理性质,如载流子寿命、光电导率和发射量子产率。最近,以PtSe2和PtS2为代表的铂二硫属化物因其优异的空气稳定性、厚度依赖的半金属到半导体转变以及奇特的磁性特性而备受关注。然而,迄今为止尚未对铂二硫属化物中的俄歇过程进行研究。在此,我们利用超快光泵太赫兹探针光谱来探索少层半导体PtSe2中的载流子动力学。由于高缺陷密度,大多数被激发的载流子在激发后约10皮秒内被缺陷捕获。我们通过提高激发强度以使陷阱位点被载流子饱和来克服这一挑战,并观察到一个涉及在快速捕获中幸存的载流子的多体过程。这个过程不是带间俄歇复合,而是缺陷辅助俄歇复合,其中自由载流子在缺陷处与捕获的载流子相互作用。理论模拟表明,这个三体俄歇过程可以近似为双分子复合,速率约为3.3×10-3平方厘米每秒。这项工作为二维半导体中超快多体过程与缺陷之间的相互作用提供了见解。