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用于本征低电流存储器件的溶液可加工二维聚合物/氧化石墨烯异质结构

Solution-Processable 2D Polymer/Graphene Oxide Heterostructure for Intrinsic Low-Current Memory Device.

作者信息

Wang Xiaojing, Yin Yuhang, Song Mengya, Zhang Heshan, Liu Zhengdong, Wu Yueyue, Chen Yuanbo, Eginligil Mustafa, Zhang Shiming, Liu Juqing, Huang Wei

机构信息

Key Laboratory of Flexible Electronics (KLOFE) & Institute of Advanced Materials (IAM), Nanjing Tech University (NanjingTech), 30 South Puzhu Road, Nanjing 211816, China.

Shaanxi Institute of Flexible Electronics (SIFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an 710072, China.

出版信息

ACS Appl Mater Interfaces. 2020 Nov 18;12(46):51729-51735. doi: 10.1021/acsami.0c15840. Epub 2020 Nov 8.

Abstract

Suppressing the operating current in resistive memory devices is an effective strategy to minimize their power consumption. Herein, we present an intrinsic low-current memory based on two-dimensional (2D) hybrid heterostructures consisting of partly reduced graphene oxide (p-rGO) and conjugated microporous polymer (CMP) with the merits of being solution-processed, large-scale, and well patterned. The device with the heterostructure of p-rGO/CMP sandwiched between highly reduced graphene oxide (h-rGO) and aluminum electrodes exhibited rewritable and nonvolatile memory behavior with an ultralow operating current (∼1 μA) and efficient power consumption (∼2.9 μW). Moreover, the on/off current ratio is over 10, and the retention time is up to 8 × 10 s, indicating the low misreading rate and high stability of data storage. So far, the value of power is about 10 times lower than those of the previous GO-based memories. The bilayer architecture provides a promising approach to construct intrinsic low-power resistive memory devices.

摘要

抑制电阻式存储器件中的工作电流是将其功耗降至最低的有效策略。在此,我们展示了一种基于二维(2D)混合异质结构的本征低电流存储器,该异质结构由部分还原的氧化石墨烯(p-rGO)和共轭微孔聚合物(CMP)组成,具有可溶液加工、大规模和图案良好的优点。夹在高度还原的氧化石墨烯(h-rGO)和铝电极之间的具有p-rGO/CMP异质结构的器件表现出可重写和非易失性存储行为,具有超低工作电流(约1 μA)和高效功耗(约2.9 μW)。此外,开/关电流比超过10,保持时间长达8×10 s,表明数据存储的误读率低且稳定性高。到目前为止,功耗值比之前基于氧化石墨烯的存储器低约10倍。这种双层结构为构建本征低功耗电阻式存储器件提供了一种有前景的方法。

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