Shenoy Bhamy Maithry, Hegde Gopalkrishna, Roy Mahapatra D
Department of Aerospace Engineering, Indian Institute of Science, Bangalore 560012, India.
BioSystems Science and Engineering, Indian Institute of Science, Bangalore 560012, India.
Biomicrofluidics. 2020 Nov 2;14(6):064102. doi: 10.1063/5.0028899. eCollection 2020 Nov.
Nano-material integrated microfluidic platforms are increasingly being considered to accelerate biological sample preparation and molecular diagnostics. A major challenge in this context is the generation of high electric fields for electroporation of cell membranes. In this paper, we have studied a novel mechanism of generating a high electric field in the microfluidic channels by using an array of semiconductor nanowires. When an electrostatic field is applied across a semiconductor nanowire array, the electric field is localized near the nanowires and the field strength is higher than what was reported previously with various other micro-geometries. Nanowires made of ZnO, Si, and Si-SiO and their orientation and array spacing are considered design parameters. It is observed that for a given ratio of the spacing between nanowires to the diameter, the electric field enhancement near the edges of ZnO nanowires is nearly 30 times higher compared to Si or Si-SiO nanowire arrays. This enhancement is a combined effect of the unique geometry with a pointed tip with a hexagonal cross section, the piezoelectric and the spontaneous polarization in the ZnO nanowires, and the electro-kinetics of the interface fluid. Considering the field localization phenomena, the trajectories of cells in the channel are analyzed. For a given inter-nanowire spacing and an applied electric field, the channels with ZnO nanowire arrays have a greater probability of cell lysis in comparison to Si-based nanowire arrays. Detailed correlations between the cell lysis probability with the inter-nanowire spacing and the applied electric field are reported.
纳米材料集成微流控平台正越来越多地被用于加速生物样品制备和分子诊断。在这种情况下,一个主要挑战是为细胞膜电穿孔产生高电场。在本文中,我们研究了一种通过使用半导体纳米线阵列在微流控通道中产生高电场的新机制。当在半导体纳米线阵列上施加静电场时,电场会局部集中在纳米线附近,且场强高于此前各种其他微几何结构所报道的场强。由氧化锌(ZnO)、硅(Si)和硅 - 二氧化硅(Si - SiO)制成的纳米线及其取向和阵列间距被视为设计参数。据观察,对于给定的纳米线间距与直径之比,ZnO纳米线边缘附近的电场增强比Si或Si - SiO纳米线阵列高出近30倍。这种增强是独特几何形状(具有六边形横截面的尖 tip)、ZnO纳米线中的压电和自发极化以及界面流体的电动学的综合作用。考虑到场局部化现象,分析了通道中细胞的轨迹。对于给定的纳米线间距和施加的电场,与基于Si的纳米线阵列相比,具有ZnO纳米线阵列的通道具有更高的细胞裂解概率。报告了细胞裂解概率与纳米线间距和施加电场之间的详细相关性。