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TFIIH 亚基 p44/p62 在核苷酸切除修复过程中充当损伤传感器。

The TFIIH subunits p44/p62 act as a damage sensor during nucleotide excision repair.

机构信息

School of Biological Sciences, University of Kent, Canterbury CT2 7NH, UK.

Rudolf Virchow Center for Integrative and Translational Bioimaging, Institute for Structural Biology, University of Würzburg, 97080 Würzburg, Germany.

出版信息

Nucleic Acids Res. 2020 Dec 16;48(22):12689-12696. doi: 10.1093/nar/gkaa973.

Abstract

Nucleotide excision repair (NER) in eukaryotes is orchestrated by the core form of the general transcription factor TFIIH, containing the helicases XPB, XPD and five 'structural' subunits, p62, p44, p34, p52 and p8. Recent cryo-EM structures show that p62 makes extensive contacts with p44 and in part occupies XPD's DNA binding site. While p44 is known to regulate the helicase activity of XPD during NER, p62 is thought to be purely structural. Here, using helicase and adenosine triphosphatase assays we show that a complex containing p44 and p62 enhances XPD's affinity for dsDNA 3-fold over p44 alone. Remarkably, the relative affinity is further increased to 60-fold by dsDNA damage. Direct binding studies show this preference derives from p44/p62's high affinity (20 nM) for damaged ssDNA. Single molecule imaging of p44/p62 complexes without XPD reveals they bind to and randomly diffuse on DNA, however, in the presence of UV-induced DNA lesions these complexes stall. Combined with the analysis of a recent cryo-EM structure, we suggest that p44/p62 acts as a novel DNA-binding entity that enhances damage recognition in TFIIH. This revises our understanding of TFIIH and prompts investigation into the core subunits for an active role during DNA repair and/or transcription.

摘要

真核生物中的核苷酸切除修复(NER)是由通用转录因子 TFIIH 的核心形式协调的,包含解旋酶 XPB、XPD 和五个“结构”亚基 p62、p44、p34、p52 和 p8。最近的冷冻电镜结构显示,p62 与 p44 有广泛的接触,并部分占据了 XPD 的 DNA 结合位点。虽然已知 p44 在 NER 期间调节 XPD 的解旋酶活性,但 p62 被认为是纯粹的结构蛋白。在这里,我们使用解旋酶和三磷酸腺苷酶测定法表明,包含 p44 和 p62 的复合物使 XPD 对 dsDNA 的亲和力比单独的 p44 提高了 3 倍。值得注意的是,dsDNA 损伤进一步将相对亲和力增加到 60 倍。直接结合研究表明,这种偏好源于 p44/p62 对受损 ssDNA 的高亲和力(20 nM)。没有 XPD 的 p44/p62 复合物的单分子成像显示它们结合并随机在 DNA 上扩散,然而,在存在 UV 诱导的 DNA 损伤时,这些复合物会停滞。结合最近的冷冻电镜结构分析,我们认为 p44/p62 作为一种新的 DNA 结合实体,增强了 TFIIH 中的损伤识别。这改变了我们对 TFIIH 的理解,并促使我们对核心亚基在 DNA 修复和/或转录过程中的活性作用进行研究。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/75b4/7736792/190c3436a238/gkaa973fig1.jpg

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