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低损耗超宽带氮化硅倾斜多模干涉型偏振分束器/合束器

Low-loss and ultra-broadband silicon nitride angled MMI polarization splitter/combiner.

作者信息

Kudalippalliyalil Ramesh, Murphy Thomas E, Grutter Karen E

出版信息

Opt Express. 2020 Nov 9;28(23):34111-34122. doi: 10.1364/OE.405188.

Abstract

The property of self-imaging combined with the polarization birefringence of the angled multimode waveguide is used to design a silicon nitride (SiN) polarization splitter (PS) at λ ∼ 1550 nm. The demonstrated PS on a 450 nm thick SiN device layer (with 2.5 µm cladding oxide) has a footprint of 80 µm×13 µm and exhibits nearly wavelength independent performance over the C+L bands. Also, the device can be configured as a polarization combiner (PC) in reverse direction with similar bandwidth and performance. The measured crosstalk (CT) and insertion loss (IL) are respectively <-18 dB (<-20 dB) and ∼0.7 dB (∼0.8 dB) for TE (TM) polarization over the measurement wavelength range of 1525 nm ≤λ ≤ 1625 nm. The measured device parameter variations suggest some tolerance to fabrication variations. Such a device is a good candidate for a photonics integrated chip (PIC) foundry-compatible, SiN PS.

摘要

利用倾斜多模波导的自成像特性与偏振双折射特性,设计了一种工作波长约为1550 nm的氮化硅(SiN)偏振分束器(PS)。在厚度为450 nm的SiN器件层(带有2.5 µm包层氧化物)上展示的该PS,占地面积为80 µm×13 µm,并且在C+L波段上表现出几乎与波长无关的性能。此外,该器件可以反向配置为具有相似带宽和性能的偏振合束器(PC)。在1525 nm≤λ≤1625 nm的测量波长范围内,对于TE(TM)偏振,测得的串扰(CT)和插入损耗(IL)分别为<-18 dB(<-20 dB)和0.7 dB(0.8 dB)。测得的器件参数变化表明对制造变化有一定的容忍度。这种器件是适用于光子集成芯片(PIC)代工兼容的SiN PS的良好候选者。

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