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氮化铟镓量子阱中沟槽缺陷的直接相关显微镜观察

Directly correlated microscopy of trench defects in InGaN quantum wells.

作者信息

O'Hanlon T J, Massabuau F C-P, Bao A, Kappers M J, Oliver R A

机构信息

Department of Materials Science and Metallurgy, University of Cambridge, 27 Charles Babbage Road, Cambridge CB3 0FS, UK.

Department of Materials Science and Metallurgy, University of Cambridge, 27 Charles Babbage Road, Cambridge CB3 0FS, UK.

出版信息

Ultramicroscopy. 2021 Dec;231:113255. doi: 10.1016/j.ultramic.2021.113255. Epub 2021 Mar 11.

Abstract

Directly correlated measurements of the surface morphology, light emission and subsurface structure and composition were carried out on the exact same nanoscale trench defects in InGaN quantum well (QW) structures. Multiple scanning probe, scanning electron and transmission electron microscopy techniques were used to explain the origin of their unusual emission behaviour and the relationship between surface morphology and cathodoluminescence (CL) redshift. Trench defects comprise of an open trench partially or fully enclosing material in InGaN QWs with different CL emission properties to their surroundings. The CL redshift was shown to typically vary with the width of the trench and the prominence of the material enclosed by the trench above its surroundings. Three defects, encompassing typical and atypical features, were prepared into lamellae for transmission electron microscopy (TEM). A cross marker technique was used in the focused ion beam-scanning electron microscope (FIB-SEM) to centre the previously characterised defects in each lamella for further analysis. The defects with wider trenches and strong redshifts in CL emission had their initiating basal-plane stacking fault (BSF) towards the bottom of the QW stack, while the BSF formed near the top of the QW stack for a defect with a narrow trench and minimal redshift. The raised-centre, prominent defect showed a slight increase in QW thickness moving up the QW stack while QW widths in the level-centred defect remained broadly constant. The indium content of the enclosed QWs increased above the BSF positions up to a maximum, with an increase of approximately 4% relative to the surroundings seen for one defect examined. Gross fluctuations in QW width (GWWFs) were present in the surrounding material in this sample but were not seen in QWs enclosed by the defect volumes. These GWWFs have been linked with indium loss from surface step edges two or more monolayers high, and many surface step edges appear pinned by the open trenches, suggesting another reason for the higher indium content seen in QWs enclosed by trench defects.

摘要

对氮化铟镓量子阱(QW)结构中完全相同的纳米级沟槽缺陷进行了表面形貌、光发射以及亚表面结构和成分的直接相关测量。使用了多种扫描探针、扫描电子和透射电子显微镜技术来解释其异常发射行为的起源以及表面形貌与阴极发光(CL)红移之间的关系。沟槽缺陷由部分或完全包围氮化铟镓量子阱中材料的开放沟槽组成,其CL发射特性与其周围环境不同。结果表明,CL红移通常随沟槽宽度以及沟槽所包围材料相对于其周围环境的突出程度而变化。制备了包含典型和非典型特征的三个缺陷薄片用于透射电子显微镜(TEM)分析。在聚焦离子束扫描电子显微镜(FIB-SEM)中使用交叉标记技术将每个薄片中先前表征的缺陷居中,以便进行进一步分析。CL发射中具有较宽沟槽和强红移的缺陷,其起始基面堆垛层错(BSF)朝向量子阱堆叠的底部,而对于具有窄沟槽和最小红移的缺陷,BSF在量子阱堆叠顶部附近形成。中心凸起的突出缺陷在量子阱堆叠向上移动时量子阱厚度略有增加,而水平中心缺陷处的量子阱宽度大致保持恒定。被包围量子阱的铟含量在BSF位置上方增加到最大值,对于所检查的一个缺陷,相对于周围环境增加了约4%。该样品周围材料中存在量子阱宽度的总体波动(GWWFs),但在缺陷区域包围的量子阱中未观察到。这些GWWFs与两个或更多单层高的表面台阶边缘的铟损失有关联,并且许多表面台阶边缘似乎被开放沟槽固定,这表明了沟槽缺陷包围的量子阱中铟含量较高的另一个原因。

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