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低温下高掺杂p型3C-SiC中压阻特性的表征。

Characterization of the piezoresistance in highly doped p-type 3C-SiC at cryogenic temperatures.

作者信息

Phan Hoang-Phuong, Dowling Karen M, Nguyen Tuan-Khoa, Chapin Caitlin A, Dinh Toan, Miller Ruth A, Han Jisheng, Iacopi Alan, Senesky Debbie G, Dao Dzung Viet, Nguyen Nam-Trung

机构信息

Queensland Micro-Nanotechnology Centre, Griffith University Queensland Australia

Department of Aeronautics and Astronautic, Stanford University USA.

出版信息

RSC Adv. 2018 Aug 24;8(52):29976-29979. doi: 10.1039/c8ra05797d. eCollection 2018 Aug 20.

Abstract

This paper reports on the piezoresistive effect in p-type 3C-SiC thin film mechanical sensing at cryogenic conditions. Nanothin 3C-SiC films with a carrier concentration of 2 × 10 cm were epitaxially grown on a Si substrate using the LPCVD process, followed by photolithography and UV laser engraving processes to form SiC-on-Si pressure sensors. The magnitude of the piezoresistive effect was measured by monitoring the change of the SiC conductance subjected to pressurizing/depressurizing cycles at different temperatures. Experimental results showed a relatively stable piezoresistive effect in the highly doped 3C-SiC film with the gauge factor slightly increased by 20% at 150 K with respect to that at room temperature. The data was also in good agreement with theoretical analysis obtained based on the charge transfer phenomenon. This finding demonstrates the potential of 3C-SiC for MEMS sensors used in a large range of temperatures from cryogenic to high temperatures.

摘要

本文报道了低温条件下p型3C-SiC薄膜机械传感中的压阻效应。采用LPCVD工艺在硅衬底上外延生长载流子浓度为2×10 cm的纳米级3C-SiC薄膜,随后通过光刻和紫外激光雕刻工艺形成硅基SiC压力传感器。通过监测不同温度下加压/减压循环时SiC电导率的变化来测量压阻效应的大小。实验结果表明,在高掺杂的3C-SiC薄膜中,压阻效应相对稳定,在150 K时的应变片系数相对于室温时略有增加20%。该数据也与基于电荷转移现象的理论分析结果高度吻合。这一发现证明了3C-SiC在从低温到高温的广泛温度范围内用于MEMS传感器的潜力。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/cf6a/9085268/da3054a58736/c8ra05797d-f1.jpg

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