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新型含咪唑配位化合物 Tc(IV, V, VII)的新颖合成方法-反应机理、X 射线衍射和希夫表面分析。

Novel Synthesis Methods of New Imidazole-Containing Coordination Compounds Tc(IV, V, VII)-Reaction Mechanism, Xrd and Hirshfeld Surface Analysis.

机构信息

Frumkin Institute of Physical Chemistry and Electrochemistry, Russian Academy of Sciences, Leninskii Prospect 31-4, 119071 Moscow, Russia.

出版信息

Int J Mol Sci. 2022 Aug 21;23(16):9461. doi: 10.3390/ijms23169461.

Abstract

In this work, we have proposed two new methods for the synthesis of [TcOL] (where L = imidazole (Im), methylimidazole (MeIm)) complexes using thiourea (Tu) and Sn(II) as the reducing agents. The main and by-products of the reactions were determined, and possible reaction mechanisms were proposed. We have shown that the reduction of Tc(VII) with thiourea is accompanied by the formation of the Tc(III) intermediate and further oxidation to Tc(V). The reaction conditions' changing can lead to the formation of Tc(VII) and Tc(IV) salts. Seven new crystal structures are described in this work: Tc(V) complexes, salts with Tc(VII) and Tc(IV) anions. For the halide salts of Tu the cell parameters were determined. In all of the obtained compounds, except for [TcO(MeIm)]TcO, there are π-stacking interactions between the aromatic rings. An increase in the anion size lead to weakening of the intermolecular interactions. The halogen bonds and anion-π interactions were also found in the hexahalide-containing compounds. The Hirshfeld surface analysis showed that the main contribution to the crystal packing is created by the van der Waals interactions of the H···H type (42.5-55.1%), H···C/C···H (17.7-21.3%) and hydrogen bonds, which contribute 15.7-25.3% in total.

摘要

在这项工作中,我们提出了两种使用硫脲 (Tu) 和 Sn(II) 作为还原剂合成 [TcOL](其中 L = 咪唑 (Im)、甲基咪唑 (MeIm)) 配合物的新方法。确定了反应的主要和副产物,并提出了可能的反应机制。我们表明,硫脲还原 Tc(VII) 伴随着 Tc(III) 中间体的形成,并进一步氧化为 Tc(V)。反应条件的改变会导致 Tc(VII) 和 Tc(IV) 盐的形成。在这项工作中描述了七个新的晶体结构:Tc(V) 配合物、含有 Tc(VII) 和 Tc(IV) 阴离子的盐。对于 Tu 的卤化物盐,确定了晶胞参数。在所获得的化合物中,除了 [TcO(MeIm)]TcO 之外,芳环之间都存在π-堆积相互作用。阴离子尺寸的增加导致分子间相互作用减弱。还在含六卤化物的化合物中发现了卤素键和阴离子-π 相互作用。Hirshfeld 表面分析表明,晶体堆积的主要贡献是由 H···H 类型的范德华相互作用(42.5-55.1%)、H···C/C···H(17.7-21.3%)和氢键创造的,它们总共贡献了 15.7-25.3%。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/0689/9408894/92b30c6194d2/ijms-23-09461-g001.jpg

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