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通过电子束和胶体光刻制备的等离子体纳米孔阵列的光学性质。

Optical properties of plasmonic nanopore arrays prepared by electron beam and colloidal lithography.

作者信息

Malekian Bita, Xiong Kunli, Kang Evan S H, Andersson John, Emilsson Gustav, Rommel Marcus, Sannomiya Takumi, Jonsson Magnus P, Dahlin Andreas

机构信息

Department of Chemistry and Chemical Engineering, Chalmers University of Technology 41296 Gothenburg Sweden

Laboratory of Organic Electronics, Linköping University 60174 Norrköping Sweden.

出版信息

Nanoscale Adv. 2019 Oct 7;1(11):4282-4289. doi: 10.1039/c9na00585d. eCollection 2019 Nov 5.

Abstract

Solid state nanopores are central structures for many applications. To date, much effort has been spent on controlled fabrication of single nanopores, while relatively little work has focused on large scale fabrication of arrays of nanopores. In this work we show wafer-scale fabrication of plasmonic nanopores in 50 nm thick silicon nitride membranes with one or two 30 nm gold films, using electron beam lithography with a negative resist or a new version of colloidal lithography. Both approaches offer good control of pore diameter (even below 100 nm) and with high yield (>90%) of intact membranes. Colloidal lithography has the advantage of parallel patterning without expensive equipment. Despite its serial nature, electron beam lithography provides high throughput and can make arbitrary array patterns. Importantly, both methods prevent metal from ending up on the membrane pore sidewalls. The new fabrication methods make it possible to compare the optical properties of structurally identical plasmonic nanopore arrays with either long-range order (e-beam) or short-range order (colloidal). The resonance features in the extinction spectrum are very similar for both structures when the pitch is the same as the characteristic spacing in the self-assembled colloidal pattern. Long-range ordering slightly enhances the magnitude of the extinction maximum and blueshift the transmission maximum by tens of nm. Upon reducing the diameter in long-range ordered arrays, the resonance is reduced in magnitude and the transmission maximum is further blue shifted, just like for short-range ordered arrays. These effects are well explained by interpreting the spectra as Fano interference between the grating-type excitation of propagating surface plasmons and the broad transmission individual pores in the metal film. Furthermore, we find that only the short-range ordered arrays scatter light, which we attribute to the highly limited effective period in the short-range ordered system and the corresponding lack of coherent suppression of scattering by interference effects.

摘要

固态纳米孔是许多应用的核心结构。迄今为止,人们在单纳米孔的可控制造方面投入了大量精力,而相对较少的工作集中在纳米孔阵列的大规模制造上。在这项工作中,我们展示了使用负性光刻胶的电子束光刻或新版本的胶体光刻技术,在具有一层或两层30 nm金膜的50 nm厚氮化硅膜中进行晶圆级等离子体纳米孔的制造。这两种方法都能很好地控制孔径(甚至低于100 nm),并且完整膜的产率很高(>90%)。胶体光刻具有无需昂贵设备即可进行并行图案化的优点。尽管电子束光刻具有串行性质,但它提供了高吞吐量并且可以制作任意阵列图案。重要的是,这两种方法都能防止金属出现在膜孔的侧壁上。这些新的制造方法使得能够比较具有长程有序(电子束)或短程有序(胶体)的结构相同的等离子体纳米孔阵列的光学性质。当间距与自组装胶体图案中的特征间距相同时,两种结构的消光光谱中的共振特征非常相似。长程有序略微增强了消光最大值的幅度,并使透射最大值蓝移数十纳米。在减小长程有序阵列的直径时,共振幅度减小,透射最大值进一步蓝移,就像短程有序阵列一样。通过将光谱解释为传播表面等离子体的光栅型激发与金属膜中单个孔的宽透射之间的法诺干涉,可以很好地解释这些效应。此外,我们发现只有短程有序阵列会散射光,我们将其归因于短程有序系统中高度有限的有效周期以及相应的缺乏干涉效应相干抑制散射的情况。

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